Dependence of the self-bias on the plasma parameters and on the electrode areas in RF plasma reactors

1996 ◽  
Vol 16 (4) ◽  
pp. 499-516 ◽  
Author(s):  
R. Deutsch ◽  
J. Schwarz
Keyword(s):  
The Self ◽  
Rf Plasma ◽  
Plasma Reactors ◽  
Plasma Parameters ◽  
Self Bias ◽  
Rf Plasma Reactors

Substrate Effect on the Diamond-Like Carbon Films Synthesized by RF Plasma Enhanced Chemical Vapor Deposition

2007 ◽  
Vol 539-543 ◽  
pp. 3574-3579 ◽  
Author(s):  
S.S. Tzeng ◽  
Wei Min Wu ◽  
J.S. Hsu
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Carbon Films ◽  
The Self ◽  
Rf Plasma ◽  
Diamond Like Carbon ◽  
Working Pressure ◽  
Glass Substrates ◽  
Self Bias

Diamond-like carbon (DLC) films were synthesized by RF plasma enhanced chemical vapor deposition using methane as carbon source. Effect of substrate on the growth of DLC films was investigated by using four different substrate materials, silicon wafer (100), glass, flat-polished and mirror-polished alumina. The carbon films were deposited at four different self-bias voltages (-157 V, -403 V, -500 V and -590 V) by changing the plasma power under fixed flow rate and working pressure. Raman analyses indicated that DLC films were deposited on silicon and glass substrates at the self-bias -403 V ~ -590 V, and polymer-like carbon films were obtained at -157 V. For the alumina substrates, different Raman results were observed for flat-polished and mirror-polished alumina substrates. The hardness of DLC films, deposited on silicon and glass substrates at the self-bias -403 V ~ -590 V, was within 16~20 GPa using nanoindentation technique.

Mass spectrometric and optical emission diagnostics for rf plasma reactors

1992 ◽  
Author(s):  
James K. Olthoff ◽  
James R. Roberts ◽  
R. J. Van Brunt ◽  
James R. Whetstone ◽  
Mark A. Sobolewski ◽  
...  
Keyword(s):  
Optical Emission ◽  
Mass Spectrometric ◽  
Rf Plasma ◽  
Plasma Reactors ◽  
Rf Plasma Reactors

Application of the physics of plasma sheaths to the modeling of rf plasma reactors

1986 ◽  
Vol 60 (9) ◽  
pp. 3081-3087 ◽  
Author(s):  
A. Metze ◽  
D. W. Ernie ◽  
H. J. Oskam
Keyword(s):  
Rf Plasma ◽  
Plasma Reactors ◽  
Plasma Sheaths ◽  
Rf Plasma Reactors

scholarly journals Characterization and Performance of Carbon Films Deposited by Plasma and Ion Beam Based Techniques

1994 ◽  
Vol 354 ◽  
Author(s):  
K.C. Walter ◽  
H. Kung ◽  
T. Levine ◽  
J.T. Tesmer ◽  
P. Kodali ◽  
...  
Keyword(s):  
Wear Rate ◽  
Surface Area ◽  
Ion Beam ◽  
Carbon Films ◽  
The Self ◽  
Line Of Sight ◽  
Rf Power ◽  
Hard Carbon ◽  
Self Bias ◽  
Cathodic Arc

AbstractPlasma and ion beam based techniques have been used to deposit carbon-based films. The ion beam based method, a cathodic arc process, used a magnetically mass analyzed beam and is inherently a line-of-sight process. Two hydrocarbon plasma-based, non-line-of-sight techniques were also used and have the advantage of being capable of coating complicated geometries. The self-bias technique can produce hard carbon films, but is dependent on rf power and the surface area of the target. The pulsed-bias technique can also produce hard carbon films but has the additional advantage of being independent of rf power and target surface area. Tribological results indicated the coefficient of friction is nearly the same for carbon films from each deposition process, but the wear rate of the cathodic arc film was five times less than for the self-bias or pulsed-bias films. Although the cathodic arc film was the hardest, contained the highest fraction of sp3 bonds and exhibited the lowest wear rate, the cathodic arc film also produced the highest wear on the 440C stainless steel counterface during tribological testing. Thus, for tribological applications requiring low wear rates for both counterfaces, coating one surface with a very hard, wear resistant film may detrimentally affect the tribological behavior of the counterface.

Generation of Efficient Terahertz Radiation by Relativistic Self-Focusing of A Cosh-Gaussian Laser Beam in A Magnetized Plasma

2021 ◽  
Author(s):  
Gunjan Purohit ◽  
Bineet Gaur ◽  
Pradeep Kothiyal ◽  
Amita Raizada
Keyword(s):  
Laser Beam ◽  
Numerical Study ◽  
The Self ◽  
Magnetized Plasma ◽  
Thz Radiation ◽  
Gaussian Laser Beam ◽  
Plasma Parameters ◽  
Gaussian Profile ◽  
Self Focusing ◽  
Incident Laser Intensity

Abstract This paper presents a scheme for the generation of terahertz (THz) radiation by self-focusing of a cosh-Gaussian laser beam in the magnetized and rippled density plasma, when relativistic nonlinearity is operative. The strong coupling between self-focused laser beam and pre-existing density ripple produces nonlinear current that originates THz radiation. THz radiation is produced by the interaction of the cosh-Gaussian laser beam with electron plasma wave under the appropriate phase matching conditions. Expressions for the beamwidth parameter of cosh-Gaussian laser beam and the electric vector of the THz radiation have been obtained using higher-order paraxial theory and solved numerically. The self-focusing of the cosh-Gaussian laser beam and its effect on the generated THz amplitude have been studied for specific laser and plasma parameters. Numerical study has been performed on various values of the decentered parameter, incident laser intensity, magnetic field, and relative density. The results have also been compared with the paraxial region as well as the Gaussian profile of laser beam. Numerical results suggest that the self-focusing of the cosh-Gaussian laser beam and the amplitude of THz radiation increase in the extended paraxial region compared to the paraxial region. It is also observed that the focusing of the cosh-Gaussian laser beam in the magnetized plasma and the amplitude of the THz radiation increases at higher values of the decentered parameter.

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