An abstract characterization of the Galois group of the algebraic closure of a local field

Journal of Soviet Mathematics ◽

10.1007/bf01089101 ◽

1987 ◽

Vol 37 (2) ◽

pp. 1041-1052 ◽

Cited By ~ 1

Author(s):

A. V. Yakovlev

Keyword(s):

Galois Group ◽

Local Field ◽

Algebraic Closure ◽

Abstract Characterization

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THE GALOIS GROUP OF THE ALGEBRAIC CLOSURE OF A LOCAL FIELD

Mathematics of the USSR-Izvestiya ◽

10.1070/im1968v002n06abeh000728 ◽

1968 ◽

Vol 2 (6) ◽

pp. 1231-1269 ◽

Cited By ~ 11

Author(s):

A V Jakovlev

Keyword(s):

Galois Group ◽

Local Field ◽

Algebraic Closure

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REMARKS ON MY PAPER “THE GALOIS GROUP OF THE ALGEBRAIC CLOSURE OF A LOCAL FIELD”

Mathematics of the USSR-Izvestiya ◽

10.1070/im1978v012n01abeh001847 ◽

1978 ◽

Vol 12 (1) ◽

pp. 205-206 ◽

Cited By ~ 3

Author(s):

A V Jakovlev

Keyword(s):

Galois Group ◽

Local Field ◽

Algebraic Closure

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Abstract Characterization of Input Symbol Semigroups of Universal Hypergraphic Automata

Lobachevskii Journal of Mathematics ◽

10.1134/s1995080220020109 ◽

2020 ◽

Vol 41 (2) ◽

pp. 214-226

Author(s):

E. V. Khvorostukhina ◽

V. A. Molchanov

Keyword(s):

Input Symbol ◽

Abstract Characterization

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ChemInform Abstract: Characterization of Nitrobenzanthracenes and Nitrodibenzanthracenes.

Chemischer Informationsdienst ◽

10.1002/chin.198616186 ◽

1986 ◽

Vol 17 (16) ◽

Author(s):

B. IVERSEN ◽

L. K. SYDNES ◽

T. GREIBROKK

Keyword(s):

Abstract Characterization

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ChemInform Abstract: CHARACTERIZATION OF CATALYST SURFACES BY CYCLIC VOLTAMMETRY

Chemischer Informationsdienst ◽

10.1002/chin.197839337 ◽

1978 ◽

Vol 9 (39) ◽

Author(s):

D. R. LOWDE ◽

J. O. WILLIAMS ◽

B. D. MCNICOL

Keyword(s):

Cyclic Voltammetry ◽

Abstract Characterization ◽

Catalyst Surfaces

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ChemInform Abstract: Characterization of Silicon Nitride and Silicon Carbonitride Layers from 1,1,3,3,5,5-Hexamethylcyclotrisilazane (I) Plasmas.

ChemInform ◽

10.1002/chin.198913323 ◽

1989 ◽

Vol 20 (13) ◽

Author(s):

T. A. BROOKS ◽

D. W. HESS

Keyword(s):

Silicon Nitride ◽

Silicon Carbonitride ◽

Abstract Characterization

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ChemInform Abstract: Characterization of Thin Silicon Oxynitride Films Prepared by Low Pressure Rapid Thermal Chemical Vapor Deposition.

ChemInform ◽

10.1002/chin.199406262 ◽

2010 ◽

Vol 25 (6) ◽

pp. no-no

Author(s):

X.-L. XU ◽

P. K. MCLARTY ◽

H. BRUSH ◽

V. MISRA ◽

J. J. WORTMAN ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Low Pressure ◽

Silicon Oxynitride ◽

Thermal Chemical Vapor Deposition ◽

Abstract Characterization ◽

Thin Silicon

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ChemInform Abstract: Characterization of Catalytic Solids by Kinetics

ChemInform ◽

10.1002/chin.199508283 ◽

2010 ◽

Vol 26 (8) ◽

pp. no-no

Author(s):

A. GERMAIN

Keyword(s):

Abstract Characterization

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ChemInform Abstract: Characterization of Catalysts by Raman Spectrometry

ChemInform ◽

10.1002/chin.199424317 ◽

2010 ◽

Vol 25 (24) ◽

pp. no-no

Author(s):

E. PAYEN

Keyword(s):

Raman Spectrometry ◽

Abstract Characterization

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ChemInform Abstract: Characterization of Indium Doped SnS2.

ChemInform ◽

10.1002/chin.199507009 ◽

2010 ◽

Vol 26 (7) ◽

pp. no-no

Author(s):

O. AMIR ◽

E. LIFSHITZ ◽

C. UZAN-SAGUY ◽

R. KALISH

Keyword(s):

Abstract Characterization

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