Peculiarities of electron-beam interaction with waves in partially plasma-filled corrugated waveguide

1991 ◽  
Vol 34 (7) ◽  
pp. 672-679 ◽  
Author(s):  
N. I. Karbushev
Keyword(s):  
Electron Beam ◽  
Corrugated Waveguide ◽  
Beam Interaction

Transmission-Line Model and Propagation in a Negative-Index, Parallel-Plate Metamaterial to Boost Electron-Beam Interaction

2014 ◽  
Vol 62 (6) ◽  
pp. 3212-3221 ◽  
Author(s):  
Nicholas Aaron Estep ◽  
Amir Nader Askarpour ◽  
Simeon Trendafilov ◽  
Gennady Shvets ◽  
Andrea Alu
Keyword(s):  
Electron Beam ◽  
Transmission Line ◽  
Parallel Plate ◽  
Negative Index ◽  
Transmission Line Model ◽  
Line Model ◽  
Beam Interaction

Optical beam deflection imaging of the electron beam interaction volume in semiconductors

1993 ◽  
Vol 63 (5) ◽  
pp. 645-647 ◽  
Author(s):  
G. Y. Chang ◽  
R. B. Givens ◽  
J. W. M. Spicer ◽  
R. Osiander ◽  
J. C. Murphy
Keyword(s):  
Electron Beam ◽  
Optical Beam ◽  
Beam Deflection ◽  
Interaction Volume ◽  
Beam Interaction

Instrument for Studying Wake Fields Influence to International Linear Collider High Intensity Bunch

2009 ◽  
Vol 4 (1) ◽  
pp. 30-36
Author(s):  
Petr Bak ◽  
Dmitriy Bolkhovityanov ◽  
Andrey Korepanov ◽  
Pavel Logatchev ◽  
Dmitriy Malyutin ◽  
...  
Keyword(s):  
Electron Beam ◽  
Measurement Error ◽  
High Intensity ◽  
Linear Collider ◽  
International Linear Collider ◽  
Basic Principles ◽  
Beam Interaction ◽  
Simulation Results ◽  
Main Components ◽  
Wake Fields

Instrument for bunch tilt measurements in linear collider is presented. Electron beam probe basic principles are described and method of bunch tilt measurements is discussed. The simulation results of testing beam interaction with tilted relativistic bunch are presented. Main components of the bunch tilt measurement error are determined.

Formation Of Two-Dimensional Photonic Crystals With Cavities Arrays In Silicon

2016 ◽  
Vol 11 (1) ◽  
pp. 88-93
Author(s):  
Dmitriy Utkin ◽  
Aleksandr Shklyaev ◽  
Fedor Dultsev ◽  
Aleksandr Latyshev
Keyword(s):  
Electron Beam ◽  
Photonic Crystals ◽  
Electron Beam Lithography ◽  
Spatial Distributions ◽  
Two Dimensional ◽  
Interference Effects ◽  
Technological Parameters ◽  
Beam Interaction ◽  
Cavity Array ◽  
Better Than

Specific aspects of finely focused electron beam interaction with the PMMA-950K resist for the fabrication of closely spaced holes having inhomogeneous spatial distributions are studied. The technological parameters for the creation of two-dimensional photonic crystals with microcavities (missing holes) arrays, which allow obtaining the lateral sizes of the structure within the accuracy better than 2 %, in silicon using electron-beam lithography are determined. Such holes fabrication accuracy is thought to be sufficient to study the interference effects of cavity array radiation in twodimensional photonic crystals.

A Study of Amorphous Chalcogenides by Electron Microscopy and Analysis

1998 ◽  
Vol 4 (S2) ◽  
pp. 714-715
Author(s):  
A. G. Fitzgerald ◽  
K. Mietzsch
Keyword(s):  
Electron Microscopy ◽  
Electron Beam ◽  
Diffusion Process ◽  
Electron Beam Lithography ◽  
Interaction Process ◽  
Metal Diffusion ◽  
Process Understanding ◽  
Amorphous Chalcogenides ◽  
Potential Applications ◽  
Beam Interaction

Amorphous chalcogenides films coated with certain metals are known to possess a remarkable sensitivity to radiation. Based on these effects they have found several important applications in the production of microcircuits, e.g. as resists in photo- and electron beam lithography. A variety of chalcogenides in combination with a range of metals has been extensively investigated with regard to potential applications in the fabrication of semiconductor devices.The objectives of the present project are to extend knowledge of the behaviour of amorphous chalcogenides in contact with metals. This includes studying the metal diffusion process, understanding the film-electron beam interaction process and evaluating the potential of the metal lines formed by the electron beam in fabrication of photomasks for the production of higher densities of silicon microcircuits.

Combined action of corrugation and Weibel instabilities from electron-beam interaction with laser-irradiated plasma

2018 ◽  
Vol 25 (3) ◽  
pp. 033112 ◽  
Author(s):  
Yafeng Bai ◽  
Ye Tian ◽  
Zhijun Zhang ◽  
Lihua Cao ◽  
Jiansheng Liu
Keyword(s):  
Electron Beam ◽  
Combined Action ◽  
Beam Interaction

scholarly journals Quantum radiation reaction in head-on laser-electron beam interaction

2016 ◽  
Vol 18 (7) ◽  
pp. 073035 ◽  
Author(s):  
Marija Vranic ◽  
Thomas Grismayer ◽  
Ricardo A Fonseca ◽  
Luis O Silva
Keyword(s):  
Electron Beam ◽  
Radiation Reaction ◽  
Quantum Radiation ◽  
Beam Interaction
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