Carrier redistribution and nonlinear SHF properties of inhomogeneous semiconductor films

1988 ◽  
Vol 31 (9) ◽  
pp. 799-803
Author(s):  
A. M. Belyantsev ◽  
V. A. Valov ◽  
M. N. Drozdov ◽  
A. L. Zheleznyak ◽  
V. A. Kozlov ◽  
...  
1999 ◽  
Vol 60 (24) ◽  
pp. 16788-16798 ◽  
Author(s):  
Guillaume Malpuech ◽  
Alexey Kavokin ◽  
Giovanna Panzarini

2020 ◽  
Vol 140 (4) ◽  
pp. 179-185
Author(s):  
Hiroshi Yamauchi ◽  
Yugo Okada ◽  
Takashi Tadokoro ◽  
Kazuhiro Kudo

Author(s):  
Norimichi Chinone ◽  
Yasuo Cho

Abstract Gate-bias dependent depletion layer distribution and carrier distributions in cross-section of SiC power MOSFET were measured by newly developed measurement system based on super-higher-order scanning nonlinear dielectric microscope. The results visualized gate-source voltage dependent redistribution of depletion layer and carrier.


Author(s):  
Guomin Ding ◽  
Honglei Chen ◽  
Zuxi Yu ◽  
Nan Liu ◽  
Min Wang
Keyword(s):  

The center plane inside a bending material has no strain, which is known as neutral mechanical plane. Based on this concept, herein, we achieve ultra-flexible semiconductor films based photodetectors at...


Electronics ◽  
2021 ◽  
Vol 10 (14) ◽  
pp. 1629
Author(s):  
Hyeon-Joong Kim ◽  
Do-Won Kim ◽  
Won-Yong Lee ◽  
Sin-Hyung Lee ◽  
Jin-Hyuk Bae ◽  
...  

In this study, sol–gel-processed Li-doped SnO2-based thin-film transistors (TFTs) were fabricated on SiO2/p+ Si substrates. The influence of Li dopant (wt%) on the structural, chemical, optical, and electrical characteristics was investigated. By adding 0.5 wt% Li dopant, the oxygen vacancy formation process was successfully suppressed. Its smaller ionic size and strong bonding strength made it possible for Li to work as an oxygen vacancy suppressor. The fabricated TFTs consisting of 0.5 wt% Li-doped SnO2 semiconductor films delivered the field-effect mobility in a 2.0 cm2/Vs saturation regime and Ion/Ioff value of 1 × 108 and showed enhancement mode operation. The decreased oxygen vacancy inside SnO2 TFTs with 0.5 wt% Li dopant improved the negative bias stability of TFTs.


2009 ◽  
Vol 48 (4) ◽  
pp. 042302
Author(s):  
Xin Wu ◽  
Ruwen Peng ◽  
De Li ◽  
Ruili Zhang ◽  
Renhao Fan ◽  
...  

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