Laser multiphoton mass spectroscopy of organometallic compounds: State selective and mass resolved detection of neutral fragment tellurium atoms from C2H5TeC2H5

1985 ◽  
Vol 38 (4) ◽  
pp. 209-218 ◽  
Author(s):  
R. Fantoni ◽  
M. Stuke
Keyword(s):  
Mass Spectroscopy ◽  
Organometallic Compounds ◽  
Neutral Fragment

A Comparison Between Energetics of Decomposition and Photo-Deposition of Pd and Pt from Pd(C5 H5 )(C3 H5) and Pt(C5H5)(C3 H5)

1988 ◽  
Vol 131 ◽  
Author(s):  
Karl-Heinz Emrich ◽  
G. T. Stauf ◽  
W. Hirschwald ◽  
S. Barfuss ◽  
P. A. Dowben ◽  
...  
Keyword(s):  
Thin Films ◽  
Auger Electron Spectroscopy ◽  
Mass Spectroscopy ◽  
Thermodynamic Data ◽  
Electron Spectroscopy ◽  
Auger Electron ◽  
Organometallic Compounds ◽  
Electron Impact Mass ◽  
Contamination Levels ◽  
Impact Mass

ABSTRACTThe energetics of decomposition of a variety of organometallic compounds have been determined from photoionization mass spectroscopy and electron impact mass spectroscopy. In particular, Pd(C5H5)(C3H5) and Pt(C5H5)(C3H5) have been studied in this fashion, and the information used to make patterned Pd/Ni/Si heterostructures by laser induced photolysis of the palladium compound and nickelocene in vacuum (MOCVD). Contamination in the thin films was determined by Auger electron spectroscopy, and compared with that found by other researchers for photo-deposition of Pt from the cyclopentadiene allyl [1].Thermodynamic data is used to explain differing contamination levels in the Pd and the Pt coatings.

Tunable Uv Laser Photolysis of Organometallic Compounds with Product Detection by Laser Mass Spectroscopy

1988 ◽  
Vol 129 ◽  
Author(s):  
Th. Beuermann ◽  
M. Stuke
Keyword(s):  
Mass Spectroscopy ◽  
Laser Light ◽  
Uv Light ◽  
Frequency Doubling ◽  
Organometallic Compounds ◽  
Dye Laser ◽  
Laser Photolysis ◽  
Photon Absorption ◽  
Uv Laser ◽  
Group Iii

ABSTRACTWe use tunable UV laser light in the region 200-320 nm, produced by frequency doubling the output of a dye laser for the decomposition of organometallic compounds. This method has been applied to TMA, trimethylaluminum AI(CH3)3. Only theTMA monomer absorbs UV light for λ>220nm. TMA decomposes by one-photon absorption mainly into two channels: aluminum plus organic fragments and aluminummonomethyl plus organic fragments. The ratio [A1]/[AICH3] is wavelength dependent. Finally, we present a mechanism to explain the photolysis of trimethyl compounds of group III elements (Al,Ga,In).

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