Preparation and plasma deposition of an NiCr-Al powder composite

1980 ◽  
Vol 19 (3) ◽  
pp. 176-178
Author(s):  
Yu. S. Borisov ◽  
Yu. A. Sidorenko ◽  
V. R. Kalinovskii ◽  
I. N. Gorbatov ◽  
V. V. Rishin ◽  
...  
Keyword(s):  
Plasma Deposition ◽  
Powder Composite ◽  
Al Powder

Embedded Flexible Fe–Si–Al Powder Composite Film Inductor for Low Power DC–DC Converters

2018 ◽  
Vol 28 (3) ◽  
pp. 1-5 ◽  
Author(s):  
Jae-Woo Lim ◽  
Hee-Jun Kim ◽  
Yong-Seung Oh ◽  
Hyung-Sik Kim ◽  
Sung-Tae Lim
Keyword(s):  
Low Power ◽  
Composite Film ◽  
Powder Composite ◽  
Al Powder

FAST PLASMA DEPOSITION OF CARBON AND SILICON LAYERS

1990 ◽  
Vol 51 (C5) ◽  
pp. C5-361-C5-367 ◽  
Author(s):  
J. J. BEULENS ◽  
A. J.M. BUURON ◽  
L. A. BISSCHOPS ◽  
T. H.J. BISSCHOPS ◽  
A. B.M. HUSKEN ◽  
...  
Keyword(s):  
Plasma Deposition

scholarly journals Atmospheric Pressure Plasma Deposition of TiO2: A Review

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2931
Author(s):  
Soumya Banerjee ◽  
Ek Adhikari ◽  
Pitambar Sapkota ◽  
Amal Sebastian ◽  
Sylwia Ptasinska
Keyword(s):  
Atmospheric Pressure ◽  
Gas Flow ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Cost Savings ◽  
Historical Background ◽  
Pressure Plasma ◽  
Wide Range ◽  
The Status ◽  
Deposition Techniques

Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.

scholarly journals Cold Plasma Deposition of Polymeric Nanoprotrusion, Nanoparticles, and Nanofilm Structures on a Slide Glass Surface

Processes ◽  
2021 ◽  
Vol 9 (1) ◽  
pp. 99
Author(s):  
Sun-Woo Yi ◽  
In-Keun Yu ◽  
Woon-Jung Kim ◽  
Seong-Ho Choi
Keyword(s):  
Contact Angle ◽  
Visible Light ◽  
Methyl Methacrylate ◽  
Cold Plasma ◽  
Plasma Deposition ◽  
Vinyl Monomers ◽  
Glass Slides ◽  
Structure Surface ◽  
One Step ◽  
Coated Surface

In this study, we coated the surface of glass slides with nanoprotrusion, nanoparticles, and nanofilm structures by one-step plasma deposition of three vinyl monomers. Three functional vinyl monomers with symmetrical polarity sites were used: methyl methacrylate (MMA), trifluoro methylmethacrylate (TFMA), and trimethylsilyl methyl methacrylate (TSMA). The TSMA/MMA (80/20, mol-%) nanoprotrusion-coated surface of slide glass was superhydrophobic, with a 153° contact angle. We also evaluated the transmittance (%) of the slide glass with nanoprotrusions in the infrared (IR) (940 nm), ultraviolet (365 nm) and visible light (380–700 nm) regions. The obtained nanoprotrusion structure surface of slide glass created by plasma deposition transmits more than 90% of visible light.

Sign in / Sign up

Export Citation Format

Share Document