FAST PLASMA DEPOSITION OF CARBON AND SILICON LAYERS

1990 ◽  
Vol 51 (C5) ◽  
pp. C5-361-C5-367 ◽  
Author(s):  
J. J. BEULENS ◽  
A. J.M. BUURON ◽  
L. A. BISSCHOPS ◽  
T. H.J. BISSCHOPS ◽  
A. B.M. HUSKEN ◽  
...  
Keyword(s):  
Plasma Deposition

scholarly journals Atmospheric Pressure Plasma Deposition of TiO2: A Review

Materials ◽  
2020 ◽  
Vol 13 (13) ◽  
pp. 2931
Author(s):  
Soumya Banerjee ◽  
Ek Adhikari ◽  
Pitambar Sapkota ◽  
Amal Sebastian ◽  
Sylwia Ptasinska
Keyword(s):  
Atmospheric Pressure ◽  
Gas Flow ◽  
Plasma Deposition ◽  
Atmospheric Pressure Plasma ◽  
Cost Savings ◽  
Historical Background ◽  
Pressure Plasma ◽  
Wide Range ◽  
The Status ◽  
Deposition Techniques

Atmospheric pressure plasma (APP) deposition techniques are useful today because of their simplicity and their time and cost savings, particularly for growth of oxide films. Among the oxide materials, titanium dioxide (TiO2) has a wide range of applications in electronics, solar cells, and photocatalysis, which has made it an extremely popular research topic for decades. Here, we provide an overview of non-thermal APP deposition techniques for TiO2 thin film, some historical background, and some very recent findings and developments. First, we define non-thermal plasma, and then we describe the advantages of APP deposition. In addition, we explain the importance of TiO2 and then describe briefly the three deposition techniques used to date. We also compare the structural, electronic, and optical properties of TiO2 films deposited by different APP methods. Lastly, we examine the status of current research related to the effects of such deposition parameters as plasma power, feed gas, bias voltage, gas flow rate, and substrate temperature on the deposition rate, crystal phase, and other film properties. The examples given cover the most common APP deposition techniques for TiO2 growth to understand their advantages for specific applications. In addition, we discuss the important challenges that APP deposition is facing in this rapidly growing field.

scholarly journals Cold Plasma Deposition of Polymeric Nanoprotrusion, Nanoparticles, and Nanofilm Structures on a Slide Glass Surface

Processes ◽  
2021 ◽  
Vol 9 (1) ◽  
pp. 99
Author(s):  
Sun-Woo Yi ◽  
In-Keun Yu ◽  
Woon-Jung Kim ◽  
Seong-Ho Choi
Keyword(s):  
Contact Angle ◽  
Visible Light ◽  
Methyl Methacrylate ◽  
Cold Plasma ◽  
Plasma Deposition ◽  
Vinyl Monomers ◽  
Glass Slides ◽  
Structure Surface ◽  
One Step ◽  
Coated Surface

In this study, we coated the surface of glass slides with nanoprotrusion, nanoparticles, and nanofilm structures by one-step plasma deposition of three vinyl monomers. Three functional vinyl monomers with symmetrical polarity sites were used: methyl methacrylate (MMA), trifluoro methylmethacrylate (TFMA), and trimethylsilyl methyl methacrylate (TSMA). The TSMA/MMA (80/20, mol-%) nanoprotrusion-coated surface of slide glass was superhydrophobic, with a 153° contact angle. We also evaluated the transmittance (%) of the slide glass with nanoprotrusions in the infrared (IR) (940 nm), ultraviolet (365 nm) and visible light (380–700 nm) regions. The obtained nanoprotrusion structure surface of slide glass created by plasma deposition transmits more than 90% of visible light.

scholarly journals Structure and peculiarities of boundary friction of ta-C coatings obtained by pulse-plasma deposition

2021 ◽  
Vol 1799 (1) ◽  
pp. 012027
Author(s):  
V D Samusenko ◽  
I A Zavidovskii ◽  
O A Streletskii ◽  
I A Buyanovskii ◽  
M M Khrushchov ◽  
...  
Keyword(s):  
Plasma Deposition ◽  
Boundary Friction ◽  
Pulse Plasma

Plasma deposition of amorphous As-S films

1991 ◽  
Vol 137-138 ◽  
pp. 1001-1004 ◽  
Author(s):  
P. Nagels ◽  
R. Callaerts ◽  
M. Van Roy ◽  
M. Vlček
Keyword(s):  
Plasma Deposition

scholarly journals Rapid Surface Modification of Ultrafiltration Membranes for Enhanced Antifouling Properties

Membranes ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 401
Author(s):  
Noresah Said ◽  
Ying Siew Khoo ◽  
Woei Jye Lau ◽  
Mehmet Gürsoy ◽  
Mustafa Karaman ◽  
...  
Keyword(s):  
Surface Modification ◽  
Deposition Time ◽  
Plasma Deposition ◽  
Membrane Surface ◽  
Pure Water ◽  
Plasma Modification ◽  
Surface Hydrophilicity ◽  
Water Cleaning ◽  
Modification Method ◽  
Modified Membrane

In this work, several ultrafiltration (UF) membranes with enhanced antifouling properties were fabricated using a rapid and green surface modification method that was based on the plasma-enhanced chemical vapor deposition (PECVD). Two types of hydrophilic monomers—acrylic acid (AA) and 2-hydroxyethyl methacrylate (HEMA) were, respectively, deposited on the surface of a commercial UF membrane and the effects of plasma deposition time (i.e., 15 s, 30 s, 60 s, and 90 s) on the surface properties of the membrane were investigated. The modified membranes were then subjected to filtration using 2000 mg/L pepsin and bovine serum albumin (BSA) solutions as feed. Microscopic and spectroscopic analyses confirmed the successful deposition of AA and HEMA on the membrane surface and the decrease in water contact angle with increasing plasma deposition time strongly indicated the increase in surface hydrophilicity due to the considerable enrichment of the hydrophilic segment of AA and HEMA on the membrane surface. However, a prolonged plasma deposition time (>15 s) should be avoided as it led to the formation of a thicker coating layer that significantly reduced the membrane pure water flux with no significant change in the solute rejection rate. Upon 15-s plasma deposition, the AA-modified membrane recorded the pepsin and BSA rejections of 83.9% and 97.5%, respectively, while the HEMA-modified membrane rejected at least 98.5% for both pepsin and BSA. Compared to the control membrane, the AA-modified and HEMA-modified membranes also showed a lower degree of flux decline and better flux recovery rate (>90%), suggesting that the membrane antifouling properties were improved and most of the fouling was reversible and could be removed via simple water cleaning process. We demonstrated in this work that the PECVD technique is a promising surface modification method that could be employed to rapidly improve membrane surface hydrophilicity (15 s) for the enhanced protein purification process without using any organic solvent during the plasma modification process.

scholarly journals High-Coercivity Fe-Co Nanoparticles Prepared by Pulsed Arc Plasma Deposition

2016 ◽  
Vol 57 (2) ◽  
pp. 207-211 ◽  
Author(s):  
Daiki Horiyama ◽  
Masashi Matsuura ◽  
Tetsuro Yamamoto ◽  
Nobuki Tezuka ◽  
Satoshi Sugimoto
Keyword(s):  
Plasma Deposition ◽  
High Coercivity ◽  
Arc Plasma ◽  
Co Nanoparticles ◽  
Pulsed Arc
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