Gas phase versus surface contributions to photolytic laser chemical vapor deposition rates

1988 ◽  
Vol 45 (4) ◽  
pp. 337-343 ◽  
Author(s):  
D. Braichotte ◽  
H. Bergh
Keyword(s):  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Laser Chemical Vapor Deposition ◽  
Deposition Rates ◽  
Phase Versus

Ba2TiO4 and Ba4Ti13O30 Thick Films Prepared by Laser Chemical Vapor Deposition and their Microstructure

2012 ◽  
Vol 508 ◽  
pp. 199-202
Author(s):  
Dong Yun Guo ◽  
Akihiko Ito ◽  
Rong Tu ◽  
Takashi Goto
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Single Phase ◽  
Thick Films ◽  
Chemical Vapor ◽  
Molar Ratio ◽  
Laser Chemical Vapor Deposition ◽  
Columnar Growth ◽  
Deposition Rates

Ba2TiO4 and Ba4Ti13O30 Thick Films Were Prepared by Laser Chemical Vapor Deposition Using Ba- and Ti-Dipivaloylmethanate Precursors. Single-Phase Ba2TiO4 Thick Films Were Obtained at 845–946 K and Ba/Ti Source Molar Ratio 2.4. Single-Phase Ba4Ti13O30 Films Were Obtained at 944–1011 K and Ba/Ti Source Molar Ratio 0.38. Ba2TiO4 Thick Films Consisted of Truncated Grains, while Ba4ti13o30 Thick Films Had Shellfish-Like Grains. Ba2TiO4 and Ba4Ti13O30 Thick Films Showed a Columnar Growth and their Deposition Rates Were 72 and 132 μm h−1, Respectively.

Roles of Gas Phase and Surface Photolysis in Laser Chemical Vapor Deposition from Fe(CO)5

1989 ◽  
Vol 158 ◽  
Author(s):  
Xin Xu ◽  
J.I. Steinfeld
Keyword(s):  
Chemical Vapor Deposition ◽  
Gas Phase ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Laser Photolysis ◽  
Chemical State ◽  
Xps Analysis ◽  
Laser Chemical Vapor Deposition ◽  
Iron Films

ABSTRACTThe chemical state of the carbon and oxygen incorporated in iron films formed by laser photolysis of Fe(CO)5 has been examined by profiling XPS analysis. A significant portion of the codeposited CO is photodissociated at the growing surface.

Laser Chemical Vapor Deposition of Thick Oxide Coatings

2006 ◽  
Vol 317-318 ◽  
pp. 495-500 ◽  
Author(s):  
Takashi Goto ◽  
Teiichi Kimura
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Physical Vapor Deposition ◽  
High Speed ◽  
Chemical Vapor ◽  
Oxide Coatings ◽  
Laser Chemical Vapor Deposition ◽  
Deposition Rates ◽  
Thin Film Coatings ◽  
Deposition Processes

Thick oxide coatings have wide-ranged applications typically thermal barrier coatings. Although high speed deposition processes, often plasma spray or electron-beam physical vapor deposition, have been employed for these applications, another route has been pursued to improve the performance of coatings. We have proposed laser chemical vapor deposition (LCVD) for high-speed and thick oxide coatings. Conventional CVD can fabricate coatings at deposition rates of several to several 10 μm/h, and conventional LCVD has been mainly focused on thin film coatings and low temperature deposition. In the present LCVD, high-speed deposition rates ranging from 300 to 3000 μm/h have been achieved for several oxide coatings such as yttria stabilized zirconia (YSZ), TiO2, Al2O3 and Y2O3. This paper describes the effect of deposition conditions on the morphology and deposition rates for the preparation of YSZ and TiO2 by LCVD.

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