Sensitivity limitations in the analysis of semiconductor devices with auger electron spectrometry (AES) and secondary ion mass spectrometry (SIMS)

R. v. Criegern; Th. Hillmer; I. Weitzel

doi:10.1007/bf00516823

Sensitivity limitations in the analysis of semiconductor devices with auger electron spectrometry (AES) and secondary ion mass spectrometry (SIMS)

Fresenius Zeitschrift für Analytische Chemie ◽

10.1007/bf00516823 ◽

1983 ◽

Vol 314 (3) ◽

pp. 293-299 ◽

Cited By ~ 9

Author(s):

R. v. Criegern ◽

Th. Hillmer ◽

I. Weitzel

Keyword(s):

Mass Spectrometry ◽

Auger Electron ◽

Secondary Ion Mass Spectrometry ◽

Semiconductor Devices ◽

Auger Electron Spectrometry ◽

Ion Mass Spectrometry ◽

Electron Spectrometry ◽

Secondary Ion

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Abstract: Surface analytical studies using ion scattering spectrometry, Auger electron spectroscopy and secondary ion mass spectrometry

Journal of Vacuum Science and Technology ◽

10.1116/1.568786 ◽

1975 ◽

Vol 12 (1) ◽

pp. 352-353 ◽

Cited By ~ 6

Author(s):

W. Heiland ◽

E. Taglauer

Keyword(s):

Mass Spectrometry ◽

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Secondary Ion Mass Spectrometry ◽

Ion Scattering ◽

Analytical Studies ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Study of Surface Processes on Copper-Beryllium by Combined Secondary Ion Mass Spectrometry and Auger Electron Spectroscopy

Japanese Journal of Applied Physics ◽

10.7567/jjaps.2s2.807 ◽

1974 ◽

Vol 13 (S2) ◽

pp. 807 ◽

Cited By ~ 1

Author(s):

R. Buhl ◽

W. K. Huber ◽

E. Löbach

Keyword(s):

Mass Spectrometry ◽

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Secondary Ion Mass Spectrometry ◽

Surface Processes ◽

Ion Mass Spectrometry ◽

Secondary Ion ◽

Copper Beryllium

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Surface analysis: x-ray photoelectron spectroscopy, Auger electron spectroscopy, and secondary ion mass spectrometry

Analytical Chemistry ◽

10.1021/ac00242a027 ◽

1982 ◽

Vol 54 (5) ◽

pp. 293-322 ◽

Cited By ~ 44

Author(s):

Noel H. Turner ◽

Richard J. Colton

Keyword(s):

Mass Spectrometry ◽

Auger Electron Spectroscopy ◽

Surface Analysis ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Secondary Ion Mass Spectrometry ◽

X Ray ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Auger electron spectroscopy and secondary ion mass spectrometry investigations of the activation of TiFe for hydrogen uptake

Journal of the Less Common Metals ◽

10.1016/0022-5088(84)90120-6 ◽

1984 ◽

Vol 101 ◽

pp. 441-451 ◽

Cited By ~ 9

Author(s):

H. Züchner ◽

U. Bilitewski ◽

G. Kirch

Keyword(s):

Mass Spectrometry ◽

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Secondary Ion Mass Spectrometry ◽

Hydrogen Uptake ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Investigation of chromium, cobalt, and nickel-implantation in silicon using Auger electron spectrometry, secondary ion mass spectrometry, Rutherford backscattering spectrometry, and Monte Carlo simulation

Analytical Chemistry ◽

10.1021/ac00015a012 ◽

1991 ◽

Vol 63 (15) ◽

pp. 1562-1570 ◽

Cited By ~ 14

Author(s):

Henning. Bubert ◽

Leopold. Palmetshofer ◽

Gerhard. Stingeder ◽

Marek. Wielunski

Keyword(s):

Mass Spectrometry ◽

Monte Carlo Simulation ◽

Monte Carlo ◽

Auger Electron ◽

Secondary Ion Mass Spectrometry ◽

Rutherford Backscattering Spectrometry ◽

Rutherford Backscattering ◽

Electron Spectrometry ◽

Secondary Ion ◽

Cobalt And Nickel

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An Auger electron spectroscopy-secondary ion mass spectrometry study of layers of Cu-Ni and Ag-Au alloys modified by ion bombardment

Thin Solid Films ◽

10.1016/0040-6090(79)90025-7 ◽

1979 ◽

Vol 63 (2) ◽

pp. 263-268 ◽

Cited By ~ 12

Author(s):

Masao Yabumoto ◽

Hiroshi Kakibayashi ◽

Mamoru Mohri ◽

Kuniaki Watanabe ◽

Toshiro Yamashina

Keyword(s):

Mass Spectrometry ◽

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Secondary Ion Mass Spectrometry ◽

Ion Bombardment ◽

Mass Spectrometry Study ◽

Ion Mass Spectrometry ◽

Secondary Ion

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A comparison of secondary ion mass spectrometry and auger electron spectroscopy as surface analytical techniques

Nuclear Instruments and Methods in Physics Research ◽

10.1016/0167-5087(83)91012-8 ◽

1983 ◽

Vol 218 (1-3) ◽

pp. 401-408 ◽

Cited By ~ 6

Author(s):

A.E. Morgan

Keyword(s):

Mass Spectrometry ◽

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Secondary Ion Mass Spectrometry ◽

Analytical Techniques ◽

Ion Mass Spectrometry ◽

Secondary Ion

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ChemInform Abstract: SURFACE ANALYSIS: X-RAY PHOTOELECTRON SPECTROSCOPY, AUGER ELECTRON SPECTROSCOPY, AND SECONDARY ION MASS SPECTROMETRY

Chemischer Informationsdienst ◽

10.1002/chin.198249370 ◽

1982 ◽

Vol 13 (49) ◽

Author(s):

N. H. TURNER ◽

R. J. COLTON

Keyword(s):

Mass Spectrometry ◽

Auger Electron Spectroscopy ◽

Surface Analysis ◽

Photoelectron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Secondary Ion Mass Spectrometry ◽

X Ray ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Auger electron spectroscopy and secondary ion mass spectrometry depth profiling with sample rotation

Thin Solid Films ◽

10.1016/0040-6090(92)90572-s ◽

1992 ◽

Vol 220 (1-2) ◽

pp. 197-203 ◽

Cited By ~ 33

Author(s):

Eun-Hee Cirlin

Keyword(s):

Mass Spectrometry ◽

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Secondary Ion Mass Spectrometry ◽

Depth Profiling ◽

Sample Rotation ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Secondary Ion Mass Spectrometry and Auger Electron Spectroscopy Semiquantitative Analysis of Metal Alloys

Quantitive Surface Analysis of Materials ◽

10.1520/stp25607s ◽

2009 ◽

pp. 182-182-5

Author(s):

LE Davis ◽

RL Gerlach

Keyword(s):

Mass Spectrometry ◽

Auger Electron Spectroscopy ◽

Electron Spectroscopy ◽

Auger Electron ◽

Secondary Ion Mass Spectrometry ◽

Metal Alloys ◽

Semiquantitative Analysis ◽

Ion Mass Spectrometry ◽

Secondary Ion

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