A new room-temperature deposition technique for optical coatings

1994 ◽  
Vol 3 (1) ◽  
pp. 23-29 ◽  
Author(s):  
P. F. Belleville ◽  
H. G. Floch
Keyword(s):  
Room Temperature ◽  
Optical Coatings ◽  
Deposition Technique ◽  
Temperature Deposition

scholarly journals Room temperature deposition of superconducting niobium nitride films by ion beam assisted sputtering

APL Materials ◽  
2018 ◽  
Vol 6 (7) ◽  
pp. 076107 ◽  
Author(s):  
Tomas Polakovic ◽  
Sergi Lendinez ◽  
John E. Pearson ◽  
Axel Hoffmann ◽  
Volodymyr Yefremenko ◽  
...  
Keyword(s):  
Room Temperature ◽  
Ion Beam ◽  
Niobium Nitride ◽  
Temperature Deposition

Room temperature deposition of crystalline HfN thin films by DC reactive magnetron sputtering

2021 ◽  
Author(s):  
Wuttichai Phae-ngam ◽  
Tossaporn Lertvanithphol ◽  
Chanunthorn Chananonnawathorn ◽  
Rattanachai Kowong ◽  
Mati Horprathum ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Room Temperature ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering ◽  
Temperature Deposition

Room-temperature deposition of hydroxyapatite/antibiotic composite coatings by vacuum cold spraying for antibacterial applications

2017 ◽  
Vol 330 ◽  
pp. 87-91 ◽  
Author(s):  
Deyan Li ◽  
Yongfeng Gong ◽  
Xiuyong Chen ◽  
Botao Zhang ◽  
Haijun Zhang ◽  
...  
Keyword(s):  
Room Temperature ◽  
Composite Coatings ◽  
Cold Spraying ◽  
Temperature Deposition

A New Buffering Layer of Photovoltaic Solar Cells

2012 ◽  
Vol 482-484 ◽  
pp. 394-397
Author(s):  
Ming Wei Li ◽  
Nan Hai Sun ◽  
Yun Wang Ge ◽  
Bo Lei Yao
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Organic Solar Cells ◽  
Room Temperature ◽  
Acid Methyl Ester ◽  
Good Alternative ◽  
Oxide Thin Film ◽  
Nio Thin Film ◽  
Temperature Deposition ◽  
Photovoltaic Solar Cells

This paper presents a new buffering layer(nickle oxide thin film) of organic solar cells. Nickle Oxide(NiO) thin film is a good alternative of hole tansporting layer. We investigates the film from physical and electrical aspects, such as morphology, deposition temperature, thickness etc. We find that the optimum fabrication conditions are: room temperature deposition, 10nm of thickness, and 30% oxygen proportion. The device strcture is Anode/NiO/P3HT[regioregular of poly(3-hexylthiophene)]: PCBM[(6,6)-phenyl C61 butyric acid methyl ester] /Al. And the best power conversion efficiency of device we got with NiO buffering layer is 2.49%, which is hundred times of ones without NiO buffering layer.

Room temperature deposition of functional ceramic films on low-cost metal substrate

2018 ◽  
Vol 44 (14) ◽  
pp. 16295-16301 ◽  
Author(s):  
Neamul H. Khansur ◽  
Udo Eckstein ◽  
Lisa Benker ◽  
Ulrike Deisinger ◽  
Benoit Merle ◽  
...  
Keyword(s):  
Room Temperature ◽  
Low Cost ◽  
Metal Substrate ◽  
Ceramic Films ◽  
Temperature Deposition ◽  
Functional Ceramic
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