scholarly journals Tunable UV laser photolysis of organometallics with product detection by laser mass spectroscopy: Trimethylaluminum

1989 ◽  
Vol 49 (2) ◽  
pp. 145-148 ◽  
Author(s):  
Th. Beuermann ◽  
M. Stuke
1988 ◽  
Vol 129 ◽  
Author(s):  
Th. Beuermann ◽  
M. Stuke

ABSTRACTWe use tunable UV laser light in the region 200-320 nm, produced by frequency doubling the output of a dye laser for the decomposition of organometallic compounds. This method has been applied to TMA, trimethylaluminum AI(CH3)3. Only theTMA monomer absorbs UV light for λ>220nm. TMA decomposes by one-photon absorption mainly into two channels: aluminum plus organic fragments and aluminummonomethyl plus organic fragments. The ratio [A1]/[AICH3] is wavelength dependent. Finally, we present a mechanism to explain the photolysis of trimethyl compounds of group III elements (Al,Ga,In).


1994 ◽  
Vol 83 (2) ◽  
pp. 129-140 ◽  
Author(s):  
B. Metzner ◽  
K. Meindl ◽  
J.-C. Panitz ◽  
O. Nuyken ◽  
T. Mezger ◽  
...  

1987 ◽  
Vol 3 (03) ◽  
pp. 229-236
Author(s):  
Ni Tuqiang ◽  
◽  
Yu Shuqin ◽  
Ma Xingxiao ◽  
Kong Fanao

1979 ◽  
Vol 70 (10) ◽  
pp. 4673-4680 ◽  
Author(s):  
Kenneth P. Gross ◽  
Dennis M. Guthals ◽  
Joseph W. Nibler

1991 ◽  
Author(s):  
Dimitar A. Angelov ◽  
M. Berger ◽  
J. Cadet ◽  
Jean-Pierre Ballini ◽  
E. Keskinova ◽  
...  

2002 ◽  
Vol 14 (1) ◽  
pp. 144-153 ◽  
Author(s):  
Josef Pola ◽  
Anna Galíková ◽  
Aftanas Galík ◽  
Vratislav Blechta ◽  
Zdeněk Bastl ◽  
...  

1999 ◽  
Vol 9 (10) ◽  
pp. 2429-2431 ◽  
Author(s):  
Josef Pola ◽  
Markéta Urbanová ◽  
Zdeněk Bastl ◽  
Jan Šubrt ◽  
Helmut Beckers
Keyword(s):  

1982 ◽  
Vol 20 (4) ◽  
pp. 277-286 ◽  
Author(s):  
M. Umemoto ◽  
H. Shinohara ◽  
N. Nishi ◽  
R. Shimada

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