Insensitive voltage-mode and current-mode filters with easily modifiable transfer functions

1996 ◽  
Vol 11 (3) ◽  
Author(s):  
Alain Fabre ◽  
Naamane Mimeche
Keyword(s):  
Transfer Functions ◽  
Current Mode ◽  
Voltage Mode

scholarly journals Minimum MOS Transistor Count Fractional-Order Voltage-Mode and Current-Mode Filters

Technologies ◽  
2019 ◽  
Vol 7 (4) ◽  
pp. 85
Author(s):  
Panagiotis Bertsias ◽  
Costas Psychalinos ◽  
Ahmed S. Elwakil ◽  
Brent Maundy
Keyword(s):  
Fractional Order ◽  
Transfer Functions ◽  
Circuit Complexity ◽  
Current Mode ◽  
Cmos Process ◽  
Mos Transistors ◽  
Correct Operation ◽  
Mos Transistor ◽  
Voltage Mode ◽  
Filter Structures

Voltage-mode and current-mode fractional-order filter topologies, which are capable of realizing various types of transfer functions, are introduced in this paper. Thanks to the employment of the transconductance parameter of the MOS transistors, the derived filter structures offer the benefit of the electronic adjustment of their frequency characteristics. With regards to the literature, the number of MOS transisitors is minimized leading to significant reduction of the circuit complexity and power dissipation. Simulation results, derived using the Design Kit of the 0.35 μm Austria Mikro Systeme CMOS process and the Cadence IC design suite, confirm the correct operation of the presented filter structures.

scholarly journals The Effect of Magnetic Field Strength and Geometry on the Deposition Rate and Ionized Flux Fraction in the HiPIMS Discharge

Plasma ◽  
2019 ◽  
Vol 2 (2) ◽  
pp. 201-221 ◽  
Author(s):  
Hamidreza Hajihoseini ◽  
Martin Čada ◽  
Zdenek Hubička ◽  
Selen Ünaldi ◽  
Michael A. Raadu ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Deposition Rate ◽  
Average Power ◽  
Current Mode ◽  
Ionization Probability ◽  
Cathode Voltage ◽  
Peak Current ◽  
Voltage Mode ◽  
Operating Modes ◽  
The Magnetic Field

We explored the effect of magnetic field strength | B | and geometry (degree of balancing) on the deposition rate and ionized flux fraction F flux in dc magnetron sputtering (dcMS) and high power impulse magnetron sputtering (HiPIMS) when depositing titanium. The HiPIMS discharge was run in two different operating modes. The first one we refer to as “fixed voltage mode” where the cathode voltage was kept fixed at 625 V while the pulse repetition frequency was varied to achieve the desired time average power (300 W). The second mode we refer to as “fixed peak current mode” and was carried out by adjusting the cathode voltage to maintain a fixed peak discharge current and by varying the frequency to achieve the same average power. Our results show that the dcMS deposition rate was weakly sensitive to variations in the magnetic field while the deposition rate during HiPIMS operated in fixed voltage mode changed from 30% to 90% of the dcMS deposition rate as | B | decreased. In contrast, when operating the HiPIMS discharge in fixed peak current mode, the deposition rate increased only slightly with decreasing | B | . In fixed voltage mode, for weaker | B | , the higher was the deposition rate, the lower was the F flux . In the fixed peak current mode, both deposition rate and F flux increased with decreasing | B | . Deposition rate uniformity measurements illustrated that the dcMS deposition uniformity was rather insensitive to changes in | B | while both HiPIMS operating modes were highly sensitive. The HiPIMS deposition rate uniformity could be 10% lower or up to 10% higher than the dcMS deposition rate uniformity depending on | B | and in particular the magnetic field topology. We related the measured quantities, the deposition rate and ionized flux fraction, to the ionization probability α t and the back attraction probability of the sputtered species β t . We showed that the fraction of the ions of the sputtered material that escape back attraction increased by 30% when | B | was reduced during operation in fixed peak current mode while the ionization probability of the sputtered species increased with increasing | B | , due to increased discharge current, when operating in fixed voltage mode.

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