Plasma chemistry of polymers

1990 ◽  
pp. 57-109 ◽  
Author(s):  
H. Biederman ◽  
Y. Osada
Keyword(s):  
Plasma Chemistry

Material Structure of Microcrystalline Silicon Deposited with an Expanding Thermal Plasma

2003 ◽  
Vol 762 ◽  
Author(s):  
C. Smit ◽  
D.L. Williamson ◽  
M.C.M. van de Sanden ◽  
R.A.C.M.M. van Swaaij
Keyword(s):  
Thermal Plasma ◽  
Hydrogen Plasma ◽  
Plasma Chemistry ◽  
Plasma Source ◽  
Growth Direction ◽  
Interaction Time ◽  
Material Structure ◽  
Average Particle ◽  
Microcrystalline Silicon ◽  
X Ray

AbstractExpanding thermal plasma CVD (ETP CVD) has been used to deposit thin microcrystalline silicon films. In this study we varied the position at which the silane is injected in the expanding hydrogen plasma: relatively far from the substrate and close to the plasma source, giving a long interaction time of the plasma with the silane, and close to the substrate, resulting in a short interaction time. The material structure is studied extensively. The crystalline fractions as obtained from Raman spectroscopy as well as from X-ray diffraction (XRD) vary from 0 to 67%. The average particle sizes vary from 6 to 17 nm as estimated from the (111) XRD peak using the Scherrer formula. Small angle X-ray scattering (SAXS) and flotation density measurements indicate void volume fractions of about 4 to 6%. When the samples are tilted the SAXS signal is lower than for the untilted case, indicating elongated objects parallel to the growth direction in the films. We show that the material properties are influenced by the position of silane injection in the reactor, indicating a change in the plasma chemistry.

Effect of plasma interactions with low-κ films as a function of porosity, plasma chemistry, and temperature

2005 ◽  
Vol 23 (2) ◽  
pp. 395 ◽  
Author(s):  
Marcus A. Worsley ◽  
Stacey F. Bent ◽  
Stephen M. Gates ◽  
Nicholas C. M. Fuller ◽  
Willi Volksen ◽  
...  
Keyword(s):  
Plasma Chemistry ◽  
Plasma Interactions

Influence of plasma chemistry on the properties of a-(Si,Ge):H alloys

2000 ◽  
Vol 266-269 ◽  
pp. 675-679 ◽  
Author(s):  
Vikram L Dalal ◽  
Sohail Haroon ◽  
Zhiyang Zhou ◽  
Tim Maxson ◽  
Kay Han
Keyword(s):  
Plasma Chemistry

Plasma sampling - a versatile tool in plasma chemistry

1980 ◽  
Vol 52 (7) ◽  
pp. 1739-1757 ◽  
Author(s):  
H. Helm ◽  
T. D. Mark ◽  
W. Lindinger
Keyword(s):  
Plasma Chemistry ◽  
Versatile Tool

Plasma chemistry in the free-burning Ar arc

2013 ◽  
Vol 46 (32) ◽  
pp. 325202 ◽  
Author(s):  
M Baeva ◽  
D Uhrlandt
Keyword(s):  
Plasma Chemistry

Plasma chemistry in fluorocarbon film deposition from pentafluoroethane/argon mixtures

1999 ◽  
Vol 17 (6) ◽  
pp. 3265-3271 ◽  
Author(s):  
Sairam Agraharam ◽  
Dennis W. Hess ◽  
Paul A. Kohl ◽  
Sue A. Bidstrup Allen
Keyword(s):  
Plasma Chemistry ◽  
Film Deposition ◽  
Fluorocarbon Film
Sign in / Sign up

Export Citation Format

Share Document