Different theoretical approaches at optical characterization of randomly rough silicon surfaces covered with native oxide layers

2018 ◽  
Vol 50 (11) ◽  
pp. 1230-1233 ◽  
Author(s):  
Ivan Ohlídal ◽  
Jiří Vohánka ◽  
Jan Mistrík ◽  
Martin Čermák ◽  
Daniel Franta
Keyword(s):  
Optical Characterization ◽  
Silicon Surfaces ◽  
Native Oxide ◽  
Oxide Layers ◽  
Theoretical Approaches

Characterization of HF Treated (100) Si Surfaces by Surface Charge Analysis (SCA)

1992 ◽  
Vol 259 ◽  
Author(s):  
Jon T. Fitch
Keyword(s):  
Electrical Properties ◽  
Surface Charge ◽  
Chemical Bonding ◽  
Oxide Thickness ◽  
Silicon Surfaces ◽  
Native Oxide ◽  
Charge Analysis ◽  
The Stability ◽  
Over Time

ABSTRACTSurface Charge Analysis (SCA), and ellipsometry have been used to study the stability over time of HF treated (100) silicon surfaces as a function of the post-HF rinse time. Using SCA, the electrical properties of the chemical terminating layer of these silicon surfaces were measured. The surfaces which remained native oxide free the longest (−10 hours) had very low Qox and Dit values on the order of 1.0 × 1011/cm2 and 5.0 × 1010 eV−lcm−2, respectively. A good correlation was found between Dit and the native oxide thickness measured by ellipsometry. This and other results are discussed in terms of the chemical bonding on the silicon surfaces.

Optical characterization of a native oxide anodically grown on gallium antimonide

1976 ◽  
Vol 28 (10) ◽  
pp. 631-632 ◽  
Author(s):  
D. E. Aspnes ◽  
B. Schwartz ◽  
A. A. Studna ◽  
L. Derick
Keyword(s):  
Gallium Antimonide ◽  
Optical Characterization ◽  
Native Oxide

Optical characterization of SiO1.1 silicon oxide layers on InSb

1987 ◽  
Vol 5 (4) ◽  
pp. 1115-1119
Author(s):  
G. Remond ◽  
R. Caye ◽  
P. H. Holloway ◽  
P. Ruzakowski
Keyword(s):  
Silicon Oxide ◽  
Optical Characterization ◽  
Oxide Layers

Chemical Control of Surfaces: From Fundamental Understanding to Practical Application

2012 ◽  
Vol 195 ◽  
pp. 65-70
Author(s):  
Melissa A. Hines
Keyword(s):  
Atomic Scale ◽  
Silicon Surfaces ◽  
Native Oxide ◽  
Native Oxide Layer ◽  
Microelectronics Industry ◽  
Industrial Adoption ◽  
Detrimental Impact ◽  
Metallic Impurities ◽  
Acidic Hydrogen

In the early days of the microelectronics industry, it became clear that even trace contaminants could have detrimental impact on the electronic properties of fabricated devices. This realization led to the development of the so-called RCA clean for silicon surfaces [], which uses sequential baths in basic and acidic hydrogen peroxide solutions, now known as SCA-1 and SCA-2, to oxidize organic materials, remove particulates, and bind metallic impurities. The detailed characterization of this process as well as its simplicity and economic viability soon led to its widespread industrial adoption. Although the RCA clean includes an optional etch in dilute HF between the two cleaning solutions to remove the native oxide layer, the overall process results in an extremely clean but electronically defectiveoxide-terminatedand thus extremely hydrophilic silicon surface, which we now know is quite rough on an atomic scale [].

scholarly journals Optics of Inhomogeneous Thin Films with Defects: Application to Optical Characterization

Coatings ◽  
2020 ◽  
Vol 11 (1) ◽  
pp. 22
Author(s):  
Ivan Ohlídal ◽  
Jiří Vohánka ◽  
Martin Čermák
Keyword(s):  
Thin Films ◽  
Thickness Distribution ◽  
Uniaxial Anisotropy ◽  
Optical Characterization ◽  
Diffraction Theory ◽  
Matrix Formalism ◽  
Transition Layers ◽  
Theoretical Approaches ◽  
Boundary Roughness

This review paper is devoted to optics of inhomogeneous thin films exhibiting defects consisting in transition layers, overlayers, thickness nonuniformity, boundary roughness and uniaxial anisotropy. The theoretical approaches enabling the inclusion of these defects into formulae expressing the optical quantities of these inhomogeneous thin films are summarized. These approaches are based on the recursive and matrix formalisms for the transition layers and overlayers, averaging of the elements of the Mueller matrix using local thickness distribution or polynomial formulation for the thickness nonuniformity, scalar diffraction theory and Rayleigh-Rice theory or their combination for boundary roughness and Yeh matrix formalism for uniaxial anisotropy. The theoretical results are illustrated using selected examples of the optical characterization of the inhomogeneous polymer-like thin films exhibiting the combination of the transition layers and thickness nonuniformity and inhomogeneous thin films of nonstoichiometric silicon nitride with the combination of boundary roughness and uniaxial anisotropy. This characterization is realized by variable angle spectroscopic ellipsometry and spectroscopic reflectometry. It is shown that using these optical techniques, the complete optical characterization of the mentioned thin films can be performed. Thus, it is presented that the values of all the parameters characterizing these films can be determined.

Nanoparticle-Decorated Surfaces for the Study of Cell-Protein-Substrate Interactions

2004 ◽  
Vol 845 ◽  
Author(s):  
Jake D. Ballard ◽  
Ludovico M. Dell'Acqua-Bellavitis ◽  
Rena Bizios ◽  
Richard W. Siegel
Keyword(s):  
Silica Nanoparticles ◽  
Surface Coverage ◽  
Silicon Oxide ◽  
Substrate Surface ◽  
Silicon Surfaces ◽  
Native Oxide ◽  
Cell Protein ◽  
Fabrication And Characterization ◽  
Nanoscale Features

ABSTRACTThe present study was motivated by the need for accurately-controlled and well-characterized novel biomaterial formulations for the study of cell-protein-material interactions. For this purpose, the current research has focused on the design, fabrication and characterization of model native oxide-coated silicon surfaces decorated with silica nanoparticles of select sizes, and has examined the adhesion of osteoblasts and fibroblasts on these nanoparticle-decorated surfaces. The results demonstrate the capability to deposit nanoparticles of select diameters and substrate surface coverage onto native silicon oxide-coated silicon, the firm attachment of these nanoparticles to the underlying native silicon oxide, and that nanoparticle size and coverage modulate adhesion of osteoblasts and fibroblasts to these substrates. The material formulations tested provide a well-controlled and well-characterized set of model substrates needed to study the effects of nanoscale features on the functions of cells that are critical to the clinical fate of implantable biomaterials.

Sign in / Sign up

Export Citation Format

Share Document