Application of Cr Kα X-ray photoelectron spectroscopy system to overlayer thickness determination

2011 ◽  
Vol 43 (13) ◽  
pp. 1632-1635 ◽  
Author(s):  
Masaaki Kobata ◽  
Igor Píš ◽  
Hiroshi Nohira ◽  
Hideo Iwai ◽  
Keisuke Kobayashi
Keyword(s):  
Photoelectron Spectroscopy ◽  
X Ray ◽  
Thickness Determination ◽  
Spectroscopy System

Accurate Thickness Determination of Both Thin SiO2on Si and Thin Si on SiO2by Angle-Resolved X-Ray Photoelectron Spectroscopy

1999 ◽  
Vol 38 (Part 1, No. 7A) ◽  
pp. 4172-4179 ◽  
Author(s):  
Toshiharu Katayama ◽  
Hidekazu Yamamoto ◽  
Masahiko Ikeno ◽  
Yoji Mashiko ◽  
Satoru Kawazu ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
X Ray ◽  
Thickness Determination

Submicrometre-area high-energy-resolution photoelectron spectroscopy system

1998 ◽  
Vol 5 (3) ◽  
pp. 1111-1113 ◽  
Author(s):  
Takanori Kiyokura ◽  
Fumihiko Maeda ◽  
Yoshio Watanabe ◽  
Eiji Shigemasa ◽  
Akira Yagishita ◽  
...  
Keyword(s):  
Energy Resolution ◽  
Photoelectron Spectroscopy ◽  
High Energy ◽  
High Energy Resolution ◽  
Spectral Measurements ◽  
X Ray ◽  
Fermi Edge ◽  
Sample Position ◽  
Instrumental Resolution ◽  
Spectroscopy System

A submicrometre-area photoelectron spectroscopy system that uses a multi-layer-coated Schwarzschild objective as the soft X-ray microbeam optics has been developed. The system is located at an undulator beamline (BL-16U) at the Photon Factory in the High Energy Accelerator Research Organization. By knife-edge measurement, the microbeam size was estimated to be 160 nm at the sample position using a 25–75% criterion. Photoelectron spectral measurements revealed that the Fermi edge width was 0.12 eV, which means that the instrumental resolution was 0.05 eV, after removing the natural broadening of the Fermi edge at room temperature. This system offers both high energy resolution and high spatial resolution.

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