Enhancement of the positive secondary ion yield during low-energy, dual-beam depth profiling of polytetrafluoroethylene with 1-keV Cs+

2005 ◽  
Vol 37 (9) ◽  
pp. 743-748 ◽  
Author(s):  
J. T. Francis ◽  
N. S. McIntyre
Keyword(s):  
Depth Profiling ◽  
Low Energy ◽  
Dual Beam ◽  
Beam Depth ◽  
Secondary Ion

An effect of measurement conditions on the depth resolution for low-energy dual-beam depth profiling using TOF-SIMS

2013 ◽  
Vol 45 (8) ◽  
pp. 1261-1265 ◽  
Author(s):  
Atsushi Murase ◽  
Takuya Mitsuoka ◽  
Mitsuhiro Tomita ◽  
Hisataka Takenaka ◽  
Hiromi Morita
Keyword(s):  
Depth Profiling ◽  
Depth Resolution ◽  
Low Energy ◽  
Tof Sims ◽  
Dual Beam ◽  
Beam Depth

Cesium/xenon dual beam depth profiling with TOF-SIMS: measurement and modeling of M+, MCs+, and M2Cs2+ yields

2004 ◽  
Vol 231-232 ◽  
pp. 749-753 ◽  
Author(s):  
J. Brison ◽  
T. Conard ◽  
W. Vandervorst ◽  
L. Houssiau
Keyword(s):  
Depth Profiling ◽  
Tof Sims ◽  
Dual Beam ◽  
Beam Depth

Dual beam depth profiling of polymer materials: comparison of C60and Ar cluster ion beams for sputtering

2012 ◽  
Vol 45 (1) ◽  
pp. 171-174 ◽  
Author(s):  
D. Rading ◽  
R. Moellers ◽  
H.-G. Cramer ◽  
E. Niehuis
Keyword(s):  
Depth Profiling ◽  
Ion Beams ◽  
Polymer Materials ◽  
Dual Beam ◽  
Beam Depth ◽  
Cluster Ion Beams ◽  
Cluster Ion

Dual beam depth profiling of organic materials: Variations of analysis and sputter beam conditions

2010 ◽  
Vol 43 (1-2) ◽  
pp. 198-200 ◽  
Author(s):  
D. Rading ◽  
R. Moellers ◽  
F. Kollmer ◽  
W. Paul ◽  
E. Niehuis
Keyword(s):  
Organic Materials ◽  
Depth Profiling ◽  
Dual Beam ◽  
Beam Depth

Dual-beam versus single-beam depth profiling: Same sample in same instrument

2013 ◽  
Vol 27 (24) ◽  
pp. 2828-2832 ◽  
Author(s):  
S. V. Baryshev ◽  
N. G. Becker ◽  
A. V. Zinovev ◽  
C. E. Tripa ◽  
I. V. Veryovkin
Keyword(s):  
Depth Profiling ◽  
Single Beam ◽  
Dual Beam ◽  
Beam Depth
Sign in / Sign up

Export Citation Format

Share Document