scholarly journals P‐1.15: Short time negative gate voltage pulse to eliminate persistent photoconductivity in Amorphous InZnO thin film transistors

2021 ◽  
Vol 52 (S1) ◽  
pp. 452-452
Author(s):  
Changhui Fan ◽  
Yu Xin ◽  
Ludong Qin ◽  
Xiaoliang Zhou ◽  
Shengdong Zhang
Author(s):  
Mengjun Du ◽  
Jinfeng Zhao ◽  
Dongli Zhang ◽  
Huaisheng Wang ◽  
Qi Shan ◽  
...  

2010 ◽  
Vol 97 (14) ◽  
pp. 143510 ◽  
Author(s):  
Khashayar Ghaffarzadeh ◽  
Arokia Nathan ◽  
John Robertson ◽  
Sangwook Kim ◽  
Sanghun Jeon ◽  
...  

2005 ◽  
Vol 902 ◽  
Author(s):  
Eisuke Tokumitsu ◽  
Masaru Senoo ◽  
Etsu Shin

AbstractWe demonstrate transparent thin film transistors (TFTs) with nonvolatile memory operation using Bi4-xLaxTi3O12 (BLT) as a gate insulator and indium tin oxide (ITO) as a channel. ITO is also used for the gate, source and drain electrodes. Drain current-drain voltage (ID-VD) characteristics of transparent ITO/BLT ferroelectric-gate TFTs exhibit excellent n-channel transistor operations. On current of 0.35 mA was obtained when the applied gate voltage is 6V. On the other hand, the off current of the device is as low as 10-10A, which indicates that the ITO channel is sufficiently depleted by the ferroelectric polarization. In addition, drain current-gate voltage (ID-VG) characteristics demonstrate clear counterclockwise hysteresis loop due to the ferroelectric gate insulator. Optical transmittance of the fabricated device is greater than 60% including the quartz substrate.


AIP Advances ◽  
2015 ◽  
Vol 5 (9) ◽  
pp. 097141 ◽  
Author(s):  
Joonwoo Kim ◽  
Sung Myung ◽  
Hee-Yeon Noh ◽  
Soon Moon Jeong ◽  
Jaewook Jeong

2020 ◽  
Vol 41 (4) ◽  
pp. 561-564 ◽  
Author(s):  
Jun Tae Jang ◽  
Hyoung-Do Kim ◽  
Dong Myong Kim ◽  
Sung-Jin Choi ◽  
Hyun-Suk Kim ◽  
...  

Sign in / Sign up

Export Citation Format

Share Document