P‐46: Fabrication and characterization of thick Cu films deposited on G8.5 LCD glass substrates for 8k and large TV panels

2020 ◽  
Vol 51 (1) ◽  
pp. 1519-1522
Author(s):  
Guo Li ◽  
Xia Hui ◽  
Tan Zhiwei ◽  
Xiao Juncheng ◽  
Zhou Hang
Keyword(s):  
Cu Films ◽  
Glass Substrates ◽  
Fabrication And Characterization

Fabrication and Characterization of Rapidly Oxidized p-Type Cu2O Films from Cu Films and their Application to Heterojunction Thin-Film Solar Cells

2013 ◽  
Vol 52 (10S) ◽  
pp. 10MB17 ◽  
Author(s):  
Hyung Soo Kim ◽  
Jung Wook Lim ◽  
Sun Jin Yun ◽  
Min A Park ◽  
Se Yong Park ◽  
...  
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Thin Film Solar Cells ◽  
Cu Films ◽  
Cu2o Films ◽  
Fabrication And Characterization ◽  
P Type

High Performance IGZO TFTs with Modified Etch Stop Structure on Glass Substrates

2014 ◽  
Vol 1633 ◽  
pp. 95-100
Author(s):  
Forough Mahmoudabadi ◽  
Ta-Ko Chuang ◽  
Jerry Ho Kung ◽  
Miltiadis K. Hatalis
Keyword(s):  
Annealing Time ◽  
High Performance ◽  
Channel Length ◽  
Device Performance ◽  
Current Ratio ◽  
Glass Substrates ◽  
Etch Stop ◽  
Current Threshold ◽  
Fabrication And Characterization

ABSTRACTIn this paper, we present fabrication and characterization of RF sputtered a-IGZO TFTs having a modified etch stopper structure with source/drain contact windows on glass wafers. The effect of annealing time and channel length on device performance in terms of mobility, on/off current ratio, average off current, threshold voltage, and sub threshold slope is reported.

Fabrication and Characterization of RF Magnetron Sputtered Silicon Oxide Films

2014 ◽  
Vol 970 ◽  
pp. 102-105
Author(s):  
Jian Wei Hoon ◽  
Kah Yoong Chan ◽  
Cheng Yang Low
Keyword(s):  
Indium Tin Oxide ◽  
Silicon Oxide ◽  
Rf Magnetron Sputtering ◽  
Surface Topology ◽  
Sputtering Deposition ◽  
Force Microscopy ◽  
Glass Substrates ◽  
Atomic Force ◽  
Fabrication And Characterization

In this work, silicon dioxide (SiO2) films were fabricated on indium tin oxide (ITO) coated glass substrates by radio frequency (RF) magnetron sputtering deposition technique. The deposition rate of the magnetron sputtered SiO2 films was investigated. The SiO2 films were characterized with the atomic force microscopy (AFM) for their surface topology. In addition, the electrical insulating strength of the magnetron sputtered SiO2 was examined.

Fabrication and characterization of Zinc Telluride (ZnTe) thin films grown on glass substrates

2019 ◽  
Vol 560 ◽  
pp. 204-207 ◽  
Author(s):  
Khalid Mehmood Ur Rehman ◽  
Xiansong Liu ◽  
Muhammad Riaz ◽  
Yujie Yang ◽  
Shuangjiu Feng ◽  
...  
Keyword(s):  
Thin Films ◽  
Zinc Telluride ◽  
Glass Substrates ◽  
Fabrication And Characterization ◽  
Znte Thin Films

Fabrication and characterization of high-density arrays of P3HT nanopillars on ITO/glass substrates

2010 ◽  
Vol 94 (7) ◽  
pp. 1247-1253 ◽  
Author(s):  
Abel Santos ◽  
Pilar Formentín ◽  
Josep Pallarés ◽  
Josep Ferré-Borrull ◽  
Lluís F. Marsal
Keyword(s):  
High Density ◽  
Glass Substrates ◽  
Ito Glass ◽  
Fabrication And Characterization
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