P-16: The impact of Deposition Rate and Hydrophobicity of Passivation Layer on The Stability of Back-Channel-Etch Amorphous InGaZnO Thin-Film Transistors
Keyword(s):
P 16
◽
2013 ◽
Vol 53
(12)
◽
pp. 1879-1885
◽
Keyword(s):
2020 ◽
Vol 8
(43)
◽
pp. 14983-14995
◽
2012 ◽
Vol 29
(6)
◽
pp. 067302
◽
Keyword(s):
2017 ◽
Vol 35
(4)
◽
pp. 04E103
◽
Keyword(s):
2013 ◽
Vol 44
(1)
◽
pp. 1047-1050
◽
Keyword(s):
Keyword(s):
Keyword(s):