scholarly journals High-Resolution Lithography with Near-Field Optical Microscopy

Scanning ◽  
2006 ◽  
Vol 18 (8) ◽  
pp. 567-571 ◽  
Author(s):  
A. Naber ◽  
H. Kock ◽  
H. Fuchs
Nanoimaging ◽  
2012 ◽  
pp. 373-394 ◽  
Author(s):  
Heath A. Huckabay ◽  
Kevin P. Armendariz ◽  
William H. Newhart ◽  
Sarah M. Wildgen ◽  
Robert C. Dunn

1998 ◽  
Author(s):  
Roderick S. Taylor ◽  
Kurt E. Leopold ◽  
Jeffrey W. Fraser ◽  
Yan Feng ◽  
Margaret Buchanan

2016 ◽  
Vol 18 (23) ◽  
pp. 15919-15926 ◽  
Author(s):  
Xiao Wang ◽  
Katharina Broch ◽  
Frank Schreiber ◽  
Alfred J. Meixner ◽  
Dai Zhang

Combining confocal and high resolution near-field optical microscopy and spectroscopy, we propose a sensitive method for determining the local morphology in organic semiconductor thin films.


2017 ◽  
Vol 56 (11) ◽  
pp. 3132 ◽  
Author(s):  
Sandeep Inampudi ◽  
Jierong Cheng ◽  
Hossein Mosallaei

Hyomen Kagaku ◽  
2007 ◽  
Vol 28 (9) ◽  
pp. 536-538 ◽  
Author(s):  
Takeshi YAMAUCHI ◽  
Tomoyuki YOSHINO ◽  
Seigo KUWAZAKI ◽  
Yoshitaka SUETSUGU ◽  
Kimiko YAMAMOTO ◽  
...  

1998 ◽  
Vol 71 (1-4) ◽  
pp. 341-344 ◽  
Author(s):  
Lukas Novotny ◽  
Bert Hecht ◽  
Dieter W. Pohl

2010 ◽  
Vol 459 ◽  
pp. 129-133
Author(s):  
Sumio Hosaka ◽  
Hirokazu Koyabu ◽  
Yusuke Aramomi ◽  
Hayato Sone ◽  
You Yin ◽  
...  

We have prototyped illumination-collection mode scanning near-field optical microscopy (SNOM) and near-field Raman spectroscopy (NFRS) with gold inner-covered aperture-less pyramidal probe in order to study the possibility to detect optical images, and Raman spectrum and Raman peak shift for stress distribution in Si device with high resolution of about 10 nm.


2015 ◽  
Vol 5 (1) ◽  
Author(s):  
D. E. Tranca ◽  
S. G. Stanciu ◽  
R. Hristu ◽  
C. Stoichita ◽  
S. A. M. Tofail ◽  
...  

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