STEM-CL investigations on the influence of stacking faults on the optical emission of cubic GaN epilayers and cubic GaN/AlN multi-quantum wells

2015 ◽  
Vol 12 (4-5) ◽  
pp. 469-472 ◽  
Author(s):  
R. M. Kemper ◽  
P. Veit ◽  
C. Mietze ◽  
A. Dempewolf ◽  
T. Wecker ◽  
...  
2014 ◽  
Vol 1736 ◽  
Author(s):  
D.J. As ◽  
R. Kemper ◽  
C. Mietze ◽  
T. Wecker ◽  
J.K.N. Lindner ◽  
...  

ABSTRACTIn this contribution we report on the optical properties of cubic AlN/GaN asymmetric multi quantum wells (MQW) structures on 3C-SiC/Si (001) substrates grown by radio-frequency plasma-assisted molecular beam epitaxy (MBE). Scanning transmission electron microscopy (STEM) and spatially resolved cathodoluminescence (CL) at room temperature and at low temperature are used to characterize the optical properties of the cubic AlN/GaN MQW structures. An increasing CL emission intensity with increasing film thickness due to the improved crystal quality was observed. This correlation can be directly connected to the reduction of the linewidth of x-ray rocking curves with increasing film thickness of the c-GaN films. Defects like stacking faults (SFs) on the {111} planes, which also can be considered as hexagonal inclusions in the cubic crystal matrix, lead to a decrease of the CL emission intensity. With low temperature CL line scans also monolayer fluctuations of the QWs have been detected and the observed transition energies agree well with solutions calculated using a one-dimensional (1D) Schrödinger-Poisson simulator.


2006 ◽  
Vol 527-529 ◽  
pp. 351-354 ◽  
Author(s):  
M.S. Miao ◽  
Walter R.L. Lambrecht

The electronic driving force for growth of stacking faults (SF) in n-type 4H SiC under annealing and in operating devices is discussed. This involves two separate aspects: an overall thermodynamic driving force due to the capture of electrons in interface states and the barriers that need to be overcome to create dislocation kinks which advance the motion of partial dislocations and hence expansion of SF. The second problem studied in this paper is whether 3C SiC quantum wells in 4H SiC can have band gaps lower than 3C SiC. First-principles band structure calculations show that this is not the case due to the intrinsic screening of the spontaneous polarization fields.


1995 ◽  
Vol 395 ◽  
Author(s):  
O. Brandt ◽  
H. Yang ◽  
A. Trampert ◽  
K. H. Ploog

ABSTRACTWe present a study of the growth of cubic GaN films on (001) GaAs by molecular beam epitaxy. Our investigations focus on the nucleation stage as well as on the subsequent growth of GaN. The phenomenon of epitaxial growth at this extreme mismatch (20%) is demonstrated to arise from a coincidence lattice between GaAs and GaN. The presence of a high-density of stacking faults in the GaN layer is explained within this understanding as being a natural consequence of the coalescence of perfectly relaxed nuclei. We furthermore analyze the growth kinetics of GaN via the surface reconstruction transitions observed upon an impinging Ga flux, from which we obtain both the desorption rate of Ga as well as the diffusion coefficient of Ga adatoms on the Ga-stabilized GaN surface. The diffusivity of Ga is found to be very low at the growth temperatures commonly used during molecular beam epitaxy, which provides an explanation for the microscopic surface roughness observed on our samples.


1997 ◽  
Vol 164 (1) ◽  
pp. 141-144 ◽  
Author(s):  
Y. T. Rebane ◽  
Y. G. Shreter ◽  
M. Albrecht

2011 ◽  
Vol 679-680 ◽  
pp. 314-317 ◽  
Author(s):  
Teddy Robert ◽  
Maya Marinova ◽  
Sandrine Juillaguet ◽  
Anne Henry ◽  
Efstathios K. Polychroniadis ◽  
...  

Both 3C and 6H stacking faults have been observed in a low doped 4H-SiC epitaxial layer grown in a hot-wall CVD reactor on a heavily doped (off-axis) 4H-SiC substrate. They appear differently on the different parts of sample, with energetic dispersion ranging from 3.01 eV to 2.52 eV. Since they behave as natural type-II quantum wells in the 4H-SiC matrix, the thickness dependence of the excitonic recombination is investigated using the standard effective mass approximation. The results are discussed in terms of built-in electric field and inter-well coupling effects.


2001 ◽  
Vol 302-303 ◽  
pp. 106-113 ◽  
Author(s):  
S.C.P Rodrigues ◽  
G.M Sipahi ◽  
L.M.R Scolfaro ◽  
J.R Leite

2017 ◽  
Vol 110 (2) ◽  
pp. 022105 ◽  
Author(s):  
Yueliang Li ◽  
Haoyuan Qi ◽  
Tobias Meisch ◽  
Matthias Hocker ◽  
Klaus Thonke ◽  
...  

2011 ◽  
Vol 83 (7) ◽  
Author(s):  
H. Machhadani ◽  
M. Tchernycheva ◽  
S. Sakr ◽  
L. Rigutti ◽  
R. Colombelli ◽  
...  

2001 ◽  
Vol 79 (18) ◽  
pp. 2886-2888 ◽  
Author(s):  
F. Hatami ◽  
G. Mussler ◽  
M. Schmidbauer ◽  
W. T. Masselink ◽  
L. Schrottke ◽  
...  

2017 ◽  
Vol 7 (1) ◽  
Author(s):  
T. Czerniuk ◽  
T. Ehrlich ◽  
T. Wecker ◽  
D. J. As ◽  
D. R. Yakovlev ◽  
...  

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