Investigation of graded index SiOxNy antireflection coating for silicon solar cell manufacturing

2007 ◽  
Vol 4 (4) ◽  
pp. 1566-1569 ◽  
Author(s):  
M. Lipiński ◽  
A. Kaminski ◽  
J.-F. Lelièvre ◽  
M. Lemiti ◽  
E. Fourmond ◽  
...  
2014 ◽  
Vol 2014 ◽  
pp. 1-8 ◽  
Author(s):  
Hsi-Chien Liu ◽  
Gou-Jen Wang

The object of this paper is to develop a high antireflection silicon solar cell. A novel two-stage metal-assisted etching (MAE) method is proposed for the fabrication of an antireflective layer of a micronanohybrid structure array. The processing time for the etching on an N-type high-resistance (NH) silicon wafer can be controlled to around 5 min. The resulting micronanohybrid structure array can achieve an average reflectivity of 1.21% for a light spectrum of 200–1000 nm. A P-N junction on the fabricated micronanohybrid structure array is formed using a low-cost liquid diffusion source. A high antireflection silicon solar cell with an average efficiency of 13.1% can be achieved. Compared with a conventional pyramid structure solar cell, the shorted circuit current of the proposed solar cell is increased by 73%. The major advantage of the two-stage MAE process is that a high antireflective silicon substrate can be fabricated cost-effectively in a relatively short time. The proposed method is feasible for the mass production of low-cost solar cells.


2004 ◽  
Vol 5 (1) ◽  
pp. 1-6 ◽  
Author(s):  
U. Gangopadhyay ◽  
Kyung-Hea Kim ◽  
S.K. Dhungel ◽  
D. Mangalaraj ◽  
J.H. Park ◽  
...  

2016 ◽  
Vol 40 ◽  
pp. 30-39 ◽  
Author(s):  
Mohamed MEDHAT ◽  
El-Sayed EL-ZAIAT ◽  
Samy FARAG ◽  
Gamal YOUSSEF ◽  
Reda ALKHADRY

2011 ◽  
Vol 66-68 ◽  
pp. 1-4
Author(s):  
Wen Liang Wang ◽  
Xiao Hong Rong

The refractive index of silicon material is very high, and antireflection coatings are widely used to improve conversion efficiencies of silicon solar cells. An ideal antireflection structure should lead to zero reflection loss on its surfaces over an extended solar spectral range for all angles of incidence. Based on optical thin film theory, a multilayer structure are adopted as initial stack, and with the aid of conjugate graduate optimized method, a broadband and wide-angle antireflection is designed for using on silicon solar cell. In our design, the incident angles of antireflection coating are considered from to , working wavelength ranges are considered from 400nm to 1200nm. Within these ranges, the design results show that it can reduce residual reflection evidently in theory.


2019 ◽  
Vol 30 (12) ◽  
pp. 11017-11026 ◽  
Author(s):  
Jayasree Roy Sharma ◽  
Pritam Banerjee ◽  
Suchismita Mitra ◽  
Hemanta Ghosh ◽  
Sukanta Bose ◽  
...  

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