All electrochemical layer deposition for crystalline silicon solar cell manufacturing: Experiments and interpretation

Solar Energy ◽  
2012 ◽  
Vol 86 (1) ◽  
pp. 548-557 ◽  
Author(s):  
F. Kröner ◽  
Z. Kröner ◽  
K. Reichmann ◽  
M. Rommel
Keyword(s):  
Solar Cell ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Crystalline Silicon Solar Cell ◽  
Cell Manufacturing ◽  
Layer Deposition

Surface Contamination of Silicon Wafer after Acidic Texturisation

2012 ◽  
Vol 187 ◽  
pp. 337-340 ◽  
Author(s):  
Antje Oltersdorf ◽  
Anamaria Moldovan ◽  
Michael Bayer ◽  
Martin Zimmer ◽  
Jochen Rentsch
Keyword(s):  
Solar Cell ◽  
Silicon Wafer ◽  
Metal Contamination ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Surface Contamination ◽  
Crystalline Silicon Solar Cell ◽  
Cell Manufacturing ◽  
Cleaning Methods ◽  
Wafer Surfaces

The acidic texture bath that is commonly used in crystalline silicon solar cell manufacturing is a mixture of HF/HNO3/H2O [. While the influences of metal contamination on silicon wafer surfaces as well as several cleaning methods were intensively investigated in the previous 30 years [ the effect of metal contaminations in texturisation baths has not yet been studied intensively. There are two categories of contaminations:

Six Sigma-based approach to optimise the diffusion process of crystalline silicon solar cell manufacturing

2013 ◽  
Vol 35 (2) ◽  
pp. 190-204 ◽  
Author(s):  
A. Guru Prasad ◽  
S. Saravanan ◽  
E.V. Gijo ◽  
Sreenivasa Murty Dasari ◽  
Raghu Tatachar ◽  
...  
Keyword(s):  
Solar Cell ◽  
Diffusion Process ◽  
Six Sigma ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Crystalline Silicon Solar Cell ◽  
Cell Manufacturing

The SiNx films process research by plasma-enhanced chemical vapor deposition in crystalline silicon solar cells

2017 ◽  
Vol 31 (16-19) ◽  
pp. 1744101 ◽  
Author(s):  
Bitao Chen ◽  
Yingke Zhang ◽  
Qiuping Ouyang ◽  
Fei Chen ◽  
Xinghua Zhan ◽  
...  
Keyword(s):  
Thin Film ◽  
Chemical Vapor Deposition ◽  
Solar Cell ◽  
Vapor Deposition ◽  
Gas Flow ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Chemical Vapor ◽  
Double Layers ◽  
Crystalline Silicon Solar Cell

SiNx thin film has been widely used in crystalline silicon solar cell production because of the good anti-reflection and passivation effect. We can effectively optimize the cells performance by plasma-enhanced chemical vapor deposition (PECVD) method to change deposition conditions such as temperature, gas flow ratio, etc. In this paper, we deposit a new layer of SiNx thin film on the basis of double-layers process. By changing the process parameters, the compactness of thin films is improved effectively. The NH3passivation technology is augmented in a creative way, which improves the minority carrier lifetime. In sight of this, a significant increase is generated in the photoelectric performance of crystalline silicon solar cell.

Sub-5 µm Thin Film Crystalline Silicon Solar Cell on Alumina Ceramic Substrate

1993 ◽  
Vol 32 (Part 2, No. 6A) ◽  
pp. L770-L773 ◽  
Author(s):  
Kenichi Ishii ◽  
Hideshi Nishikawa ◽  
Tetsuo Takahashi ◽  
Yutaka Hayashi
Keyword(s):  
Thin Film ◽  
Solar Cell ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Alumina Ceramic ◽  
Ceramic Substrate ◽  
Crystalline Silicon Solar Cell

Performance of single crystalline silicon solar cell with irradiance

2015 ◽  
Author(s):  
Subhash Chander ◽  
A. Purohit ◽  
Anshu Nehra ◽  
S. P. Nehra ◽  
M. S. Dhaka
Keyword(s):  
Solar Cell ◽  
Silicon Solar Cell ◽  
Crystalline Silicon ◽  
Crystalline Silicon Solar Cell ◽  
Single Crystalline Silicon ◽  
Single Crystalline
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