scholarly journals Low wavenumber Raman spectroscopy of highly crystalline MoSe2grown by chemical vapor deposition

2015 ◽  
Vol 252 (11) ◽  
pp. 2385-2389 ◽  
Author(s):  
Maria O'Brien ◽  
Niall McEvoy ◽  
Damien Hanlon ◽  
Kangho Lee ◽  
Riley Gatensby ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor

Omcvd Elaboration and Characterization of Silicon Carbide and Carbon-Silicon Carbide Films from Organosilicon Compounds

1992 ◽  
Vol 271 ◽  
Author(s):  
R. Morancho ◽  
A. Reynes ◽  
M'b. Amjoud ◽  
R. Carles
Keyword(s):  
Thin Films ◽  
Silicon Carbide ◽  
Raman Spectroscopy ◽  
Chemical Vapor Deposition ◽  
Thermal Behavior ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Organosilicon Compounds ◽  
Carrier Gas

ABSTRACTTwo organosilicon molecules tetraethysilane (TESi) and tetravinylsilane (TVSi) were used to prepare thin films of silicon carbide by chemical vapor deposition (C. V. D.). In each of the molecule, the ratio C/Si = 8, the only difference between TESi and TVSi is the structure of the radicals ethyl (.CH2-CH3) and vinyl (.CH=CH2). This feature induces different thermal behavior and leads to the formation of different materials depending on the nature of the carrier gas He or H2· The decomposition gases are correlated with the material deposited which is investigated by I.R. and Raman spectroscopy. The structure of the starting molecule influences the mechanisms of decomposition and consequently the structure of the material obtained.

scholarly journals Single Layer Graphene and Vertical Graphene as a Promising Candidate for Electrochemical Biosensors

2020 ◽  
Vol 71 (5) ◽  
pp. 24-29
Author(s):  
Bianca Tincu ◽  
Mariaora Avram ◽  
Vasilica Tucureanu ◽  
Carmen Mihailaescu ◽  
Oana Tutunaru ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Electrochemical Method ◽  
Electrochemical Sensors ◽  
High Surface ◽  
Chemical Vapor ◽  
Structure Characterization ◽  
Single Layer Graphene ◽  
Working Electrode

Recently, graphene as a material for sensors has attracted attention due to unique properties, such as: excellent electrical and thermal conductivity, chemical stability, high surface area and Young�s modulus ̴ 1GPa, very promising for electrochemical applications. Electrochemical sensors based on graphene have been used in many applications, such as: biomolecules, gases or metal ions detection. Here, we report the effect of morphology and orientation of graphene as electrode material with electrochemical method. We investigated the capacitive performance in the case of horizontal and vertical graphene sheets, synthetized by thermal chemical vapor deposition (CVD), respectively plasma enhanced chemical vapor deposition (PECVD). Graphene electrode is used in electrochemical cells with three electrodes as a working electrode. Raman spectroscopy was carried on the graphene films for quality and structure characterization. The working electrode was characterized by scanning electron microscopy (SEM), Raman spectroscopy and electrochemical method.

Raman Spectroscopy of Nanocrystalline Chemical Vapor Deposition Diamond

2013 ◽  
Vol 40 (7) ◽  
pp. 0707002
Author(s):  
薛海鹏 Xue Haipeng ◽  
卢文壮 Lu Wenzhuang ◽  
孙达飞 Sun Dafei ◽  
王浩 Wang Hao ◽  
王正鑫 Wang Zhengxin ◽  
...  
Keyword(s):  
Raman Spectroscopy ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Chemical Vapor ◽  
Chemical Vapor Deposition Diamond

A Comparison of Diamond-Like Carbon Films Properties Obtained by Plasma Enhanced Chemical Vapor Deposition and Electro-Deposition

2016 ◽  
Vol 852 ◽  
pp. 1029-1033 ◽  
Author(s):  
Ning Wang ◽  
Jing Wang ◽  
Fu Wei Zheng ◽  
Yu Min Wu ◽  
Bao Rong Hou
Keyword(s):  
Raman Spectroscopy ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Electron Cyclotron Resonance ◽  
Electrochemical Impedance ◽  
Low Cost ◽  
Chemical Vapor ◽  
Carbon Films ◽  
Diamond Like Carbon ◽  
Electro Deposition

This paper compares the microstructure and electrochemical properties of the diamond-like carbon films obtained by two different deposition methods - microwave electron cyclotron resonance plasma enhanced chemical vapor deposition (MWECR-PECVD) techniques and electro-deposition – chosen for their low cost and capacity to produce films. The microstructure of the DLC films are investigated by Raman spectroscopy, FTIR spectroscopy, and electrochemical behavior is investigated by potentiodynamic and electrochemical impedance spectroscopy (EIS). Raman spectroscopy indicates that all the films deposited by different techniques show amorphous structure and typical characteristic of DLC film. FTIR spectrum results indicate that these DLC films are a-C:H films. As a result of EIS, the DLC films made by different methods showed obviously different electrochemical characters. The obtained results show that the DLC films deposited using the PECVD methods provided the better results, presenting a high corrosion resistance , high adherence to substrate, and a denser and more uniform surface.

Sign in / Sign up

Export Citation Format

Share Document