Generation of Positive and Negative Oxygen Ions in Magnetron Discharge During Reactive Sputtering of Alumina

2010 ◽  
Vol 7 (11) ◽  
pp. 910-914 ◽  
Author(s):  
Petr Pokorný ◽  
Jiří Bulíř ◽  
Ján Lančok ◽  
Jindřich Musil ◽  
Michal Novotný
Keyword(s):  
Reactive Sputtering ◽  
Magnetron Discharge ◽  
Oxygen Ions

Energetic oxygen ions in ZrO2 deposition by reactive sputtering of Zr

Vacuum ◽  
2002 ◽  
Vol 66 (3-4) ◽  
pp. 279-284 ◽  
Author(s):  
Kikuo Tominaga ◽  
Takuya Kikuma ◽  
Kazuya Kusaka ◽  
Takao Hanabusa
Keyword(s):  
Reactive Sputtering ◽  
Oxygen Ions

Mass‐to‐charge ion composition of plasma in a magnetron discharge with reactive sputtering of titanium target

2020 ◽  
Author(s):  
Andrey V. Tyunkov ◽  
Victor A. Burdovitsin ◽  
Efim M. Oks ◽  
Maxim V. Shandrikov ◽  
Yury G. Yushkov ◽  
...  
Keyword(s):  
Reactive Sputtering ◽  
Ion Composition ◽  
Magnetron Discharge ◽  
Titanium Target

Study on reactive sputtering of titanium in the linear magnetron discharge

2006 ◽  
Vol 201 (6) ◽  
pp. 3571-3576 ◽  
Author(s):  
B. Kułakowska-Pawlak ◽  
J. Walkowicz
Keyword(s):  
Reactive Sputtering ◽  
Magnetron Discharge

Preparation and characterization of thin films of carbon nitride

1995 ◽  
Vol 53 ◽  
pp. 104-105
Author(s):  
L. Wan ◽  
R. F. Egerton
Keyword(s):  
Carbon Nitride ◽  
Arc Discharge ◽  
Ion Beam ◽  
Chemical Vapor ◽  
Reactive Sputtering ◽  
Vacuum Arc ◽  
Specimen Preparation ◽  
Bonding Structure ◽  
Electron Energy Loss

INTRODUCTION Recently, a new compound carbon nitride (CNx) has captured the attention of materials scientists, resulting from the prediction of a metastable crystal structure β-C3N4. Calculations showed that the mechanical properties of β-C3N4 are close to those of diamond. Various methods, including high pressure synthesis, ion beam deposition, chemical vapor deposition, plasma enhanced evaporation, and reactive sputtering, have been used in an attempt to make this compound. In this paper, we present the results of electron energy loss spectroscopy (EELS) analysis of composition and bonding structure of CNX films deposited by two different methods.SPECIMEN PREPARATION Specimens were prepared by arc-discharge evaporation and reactive sputtering. The apparatus for evaporation is similar to the traditional setup of vacuum arc-discharge evaporation, but working in a 0.05 torr ambient of nitrogen or ammonia. A bias was applied between the carbon source and the substrate in order to generate more ions and electrons and change their energy. During deposition, this bias causes a secondary discharge between the source and the substrate.

Transparency Improvement of SiCO Thin Film for Optical Waveguide with Reactive Sputtering Method

2020 ◽  
Vol 140 (12) ◽  
pp. 369-373
Author(s):  
Hiroyuki Nikkuni ◽  
Chizuru Numata ◽  
Ryoto Yamaji ◽  
Hiroshi Ito ◽  
Yoshio Kawamata
Keyword(s):  
Thin Film ◽  
Optical Waveguide ◽  
Reactive Sputtering
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