Characterization of photoresists for ArF-excimer laser lithography using monoenergetic positron beams

2003 ◽  
Vol 42 (2) ◽  
pp. 341-346
Author(s):  
A. Uedono ◽  
T. Ohdaira ◽  
R. Suzuki ◽  
T. Mikado ◽  
S. Fukui ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Arf Excimer Laser ◽  
Positron Beams

Characterization of GaAs surfaces treated with phosphine gas photodecomposed by an ArF excimer laser

1998 ◽  
Vol 72 (12) ◽  
pp. 1472-1474 ◽  
Author(s):  
Takashi Sugino ◽  
Hideaki Ninomiya ◽  
Junji Shirafuji ◽  
Koichiro Matsuda
Keyword(s):  
Excimer Laser ◽  
Arf Excimer Laser

scholarly journals Resists Using the Absorption Band Shift Method for ArF Excimer Laser Lithography.

1998 ◽  
Vol 11 (3) ◽  
pp. 489-492
Author(s):  
Takeshi Okino ◽  
Koji Asakawa ◽  
Naomi Shida ◽  
Tohru Ushirogouchi
Keyword(s):  
Absorption Band ◽  
Excimer Laser ◽  
Band Shift ◽  
Shift Method ◽  
Laser Lithography ◽  
Arf Excimer Laser

Characterization of $\bf LiNbO_{3}$ Optical-Waveguide Film Grown on Sapphire by ArF Excimer Laser Ablation

1995 ◽  
Vol 34 (Part 1, No. 11) ◽  
pp. 6084-6091 ◽  
Author(s):  
Masamitsu Haruna ◽  
\ast ◽  
Hideki Ishizuki ◽  
Jun Tsutsumi ◽  
Yusaku Shimaoka ◽  
...  
Keyword(s):  
Laser Ablation ◽  
Optical Waveguide ◽  
Excimer Laser ◽  
Excimer Laser Ablation ◽  
Arf Excimer Laser

ArF excimer laser lithography with bottom antireflective coating

1998 ◽  
Author(s):  
Shinji Kishimura ◽  
Makoto Takahashi ◽  
Keisuke Nakazawa ◽  
Takeshi Ohfuji ◽  
Masaru Sasago ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Antireflective Coating ◽  
Laser Lithography ◽  
Arf Excimer Laser

Dissolution behavior of alicyclic polymers designed for ArF excimer laser lithography

1996 ◽  
Author(s):  
Takeshi Ohfuji ◽  
Katsumi Maeda ◽  
Kaichiro Nakano ◽  
Etsuo Hasegawa
Keyword(s):  
Excimer Laser ◽  
Dissolution Behavior ◽  
Laser Lithography ◽  
Arf Excimer Laser
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