High-resolution surface imaging process using difunctional silylating reagent B(DMA)MS for ArF excimer laser lithography

1995 ◽  
Author(s):  
Katsumi Maeda ◽  
Takeshi Ohfuji ◽  
Naoaki Aizaki ◽  
Etsuo Hasegawa
Keyword(s):  
High Resolution ◽  
Excimer Laser ◽  
Surface Imaging ◽  
Laser Lithography ◽  
Arf Excimer Laser

High Resolution Displacement of Functional Groups onto Fluorocarbon Resin Surface by Using ArF Excimer Laser

1996 ◽  
Vol 451 ◽  
Author(s):  
T. Shimizu ◽  
M. Murahara
Keyword(s):  
Contact Angle ◽  
High Resolution ◽  
Laser Beam ◽  
Thin Layer ◽  
Functional Groups ◽  
Excimer Laser ◽  
Laser Fluence ◽  
Large Area ◽  
Three Solutions ◽  
Arf Excimer Laser

ABSTRACTA Fluorocarbon resin surface was selectively modified by irradiation with a ArF laser beam through a thin layer of NaAlO2, B(OH)3, or H2O solution to give a hydrophilic property. As a result, with low fluence, the surface was most effectively modified with the NaAlO2 solution among the three solutions. However, the contact angle in this case changed by 10 degrees as the fluence changed only 1mJ/cm2. When modifying a large area of the surface, high resolution displacement could not be achieved because the laser beam was not uniform in displacing functional groups. Thus, the laser fluence was successfully made uniform by homogenizing the laser beam; the functional groups were replaced on the fluorocarbon resin surface with high resolution, which was successfully modified to be hydrophilic by distributing the laser fluence uniformly.

scholarly journals Resists Using the Absorption Band Shift Method for ArF Excimer Laser Lithography.

1998 ◽  
Vol 11 (3) ◽  
pp. 489-492
Author(s):  
Takeshi Okino ◽  
Koji Asakawa ◽  
Naomi Shida ◽  
Tohru Ushirogouchi
Keyword(s):  
Absorption Band ◽  
Excimer Laser ◽  
Band Shift ◽  
Shift Method ◽  
Laser Lithography ◽  
Arf Excimer Laser

ArF excimer laser lithography with bottom antireflective coating

1998 ◽  
Author(s):  
Shinji Kishimura ◽  
Makoto Takahashi ◽  
Keisuke Nakazawa ◽  
Takeshi Ohfuji ◽  
Masaru Sasago ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Antireflective Coating ◽  
Laser Lithography ◽  
Arf Excimer Laser

Dissolution behavior of alicyclic polymers designed for ArF excimer laser lithography

1996 ◽  
Author(s):  
Takeshi Ohfuji ◽  
Katsumi Maeda ◽  
Kaichiro Nakano ◽  
Etsuo Hasegawa
Keyword(s):  
Excimer Laser ◽  
Dissolution Behavior ◽  
Laser Lithography ◽  
Arf Excimer Laser

scholarly journals Resist processes for ArF excimer laser lithography.

1993 ◽  
Vol 6 (4) ◽  
pp. 473-490 ◽  
Author(s):  
RODERICK R. KUNZ ◽  
MARK A. HARTNEY ◽  
MARK W. HORN ◽  
CRAIG L. KEAST ◽  
MORDECHAI ROTHSCHILD ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Laser Lithography ◽  
Arf Excimer Laser
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