A sub-0.5 ?m bilevel lithographic process using the deep-UV electron-beam resist p(si-cms)
1989 ◽
Vol 29
(14)
◽
pp. 920-927
◽
2000 ◽
Vol 13
(4)
◽
pp. 497-502
1998 ◽
Vol 322
(1-2)
◽
pp. 254-258
◽
1990 ◽
Vol 11
(1-4)
◽
pp. 487-489
◽
1989 ◽
Vol 28
(Part 2, No. 10)
◽
pp. L1863-L1865
◽