The morphology and structure of PS-b-P4VP block copolymer films by solvent annealing: effect of the solvent parameter

2009 ◽  
Vol 22 (6) ◽  
pp. 915-923 ◽  
Author(s):  
Sheena O'Driscoll ◽  
G Demirel ◽  
Richard A. Farrell ◽  
Thomas G. Fitzgerald ◽  
Colm O'Mahony ◽  
...  
2015 ◽  
Vol 2015 ◽  
pp. 1-10
Author(s):  
Colm T. O’Mahony ◽  
Dipu Borah ◽  
Michael A. Morris

Block copolymer (BCP) lithography makes use of the microphase separation properties of BCPs to pattern ordered nanoscale features over large areas. This work presents the microphase separation of an asymmetric polystyrene-block-poly(ferrocenyl dimethylsilane) (PS-b-PFS) BCP that allows ordered arrays of nanostructures to be formed by spin casting PS-b-PFS on substrates and subsequent solvent annealing. The effects of the solvent annealing conditions on self-assembly and structural stability are discussed.


2016 ◽  
Vol 27 (46) ◽  
pp. 465301 ◽  
Author(s):  
Keehong Lee ◽  
Melissa Kreider ◽  
Wubin Bai ◽  
Li-Chen Cheng ◽  
Saman Safari Dinachali ◽  
...  

Polymer ◽  
2012 ◽  
Vol 53 (21) ◽  
pp. 4827-4833 ◽  
Author(s):  
Zhen-Yuan Guo ◽  
Mei-Syun Lin ◽  
Yang-Ting Chang ◽  
Ya-Sen Sun ◽  
Yeo-Wan Chiang ◽  
...  

Polymer ◽  
2014 ◽  
Vol 55 (6) ◽  
pp. 1601-1608 ◽  
Author(s):  
Guanghui Cui ◽  
Masamichi Fujikawa ◽  
Shusaku Nagano ◽  
Masami Sano ◽  
Hiroshi Takase ◽  
...  

2021 ◽  
Vol 54 (3) ◽  
pp. 1564-1573
Author(s):  
Maninderjeet Singh ◽  
Wenjie Wu ◽  
Monali N. Basutkar ◽  
Joseph Strzalka ◽  
Abdullah M. Al-Enizi ◽  
...  

ACS Nano ◽  
2012 ◽  
Vol 6 (9) ◽  
pp. 8052-8059 ◽  
Author(s):  
Kevin W. Gotrik ◽  
Adam F. Hannon ◽  
Jeong Gon Son ◽  
Brent Keller ◽  
Alfredo Alexander-Katz ◽  
...  

2021 ◽  
Vol 23 ◽  
pp. 101006
Author(s):  
Seungyun Jo ◽  
Haedong Park ◽  
Taesuk Jun ◽  
Kwangjin Kim ◽  
Hyunsoo Jung ◽  
...  

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