Phase-Controlled Deposition of Copper Sulfide Thin Films by Using Single-Molecular Precursors

2013 ◽  
Vol 2014 (3) ◽  
pp. 533-538 ◽  
Author(s):  
Saba Ashraf ◽  
Aamer Saeed ◽  
Mohammad Azad Malik ◽  
Ulrich Flörke ◽  
Michael Bolte ◽  
...  
Keyword(s):  
Thin Films ◽  
Copper Sulfide ◽  
Molecular Precursors ◽  
Controlled Deposition

Fundamental Research into Thin Films in a Developing Country

1972 ◽  
Vol 30 ◽  
pp. 500-501
Author(s):  
J.A. Eades ◽  
E. Grünbaum
Keyword(s):  
Thin Films ◽  
Growth Process ◽  
Empirical Process ◽  
Nucleation And Growth ◽  
Research Groups ◽  
Film Research ◽  
Fundamental Research ◽  
Controlled Deposition ◽  
The One ◽  
The University

In the last decade and a half, thin film research, particularly research into problems associated with epitaxy, has developed from a simple empirical process of determining the conditions for epitaxy into a complex analytical and experimental study of the nucleation and growth process on the one hand and a technology of very great importance on the other. During this period the thin films group of the University of Chile has studied the epitaxy of metals on metal and insulating substrates. The development of the group, one of the first research groups in physics to be established in the country, has parallelled the increasing complexity of the field.The elaborate techniques and equipment now needed for research into thin films may be illustrated by considering the plant and facilities of this group as characteristic of a good system for the controlled deposition and study of thin films.

scholarly journals HfS2 thin films deposited at room temperature by an emerging technique, solution atomic layer deposition

2021 ◽  
Author(s):  
Yuanyuan Cao ◽  
Sha Zhu ◽  
Julien Bachmann
Keyword(s):  
Thin Films ◽  
Atomic Layer Deposition ◽  
Room Temperature ◽  
Atomic Layer ◽  
Two Dimensional ◽  
Molecular Precursors ◽  
Layer Deposition

The two-dimensional material and semiconducting dichalcogenide hafnium disulfide is deposited at room temperature by atomic layer deposition from molecular precursors dissolved in hexane.

scholarly journals Deposition of cadmium sulfide and zinc sulfide thin films by aerosol-assisted chemical vapors from molecular precursors

2015 ◽  
Vol 39 ◽  
pp. 169-178 ◽  
Author(s):  
Ashfaque Ahmed MEMON ◽  
Malik DILSHAD ◽  
Neerish REVAPRASADU ◽  
Mohammad Azad MALIK ◽  
James RAFTERY ◽  
...  
Keyword(s):  
Thin Films ◽  
Cadmium Sulfide ◽  
Zinc Sulfide ◽  
Molecular Precursors

CONDUCTIVE COPPER SULFIDE THIN FILMS ON POLYIMIDE FOILS FOR OPTICAL AND OPTOELECTRONIC APPLICATIONS

2001 ◽  
Vol 15 (17n19) ◽  
pp. 774-777 ◽  
Author(s):  
J. CARDOSO ◽  
O. GOMEZ-DAZA ◽  
L. IXTLILCO ◽  
M. T. S. NAIR ◽  
P. K. NAIR
Keyword(s):  
Thin Films ◽  
Sheet Resistance ◽  
Copper Sulfide ◽  
Optoelectronic Device ◽  
Infrared Reflectance ◽  
Thermally Stable ◽  
Conductive Coatings ◽  
Device Structures ◽  
Conductive Substrates ◽  
Optoelectronic Applications

Copper sulfide thin films of 75 nm and 100 nm thickness were coated on Kapton foils (PI) of 25 nm thickness by floating them on a chemical bath. The foils were annealed at 150°C-400°C in N 2 converting the coating from CuS to Cu 1.8 S . The sheet resistance of the annealed coatings (100 nm) is 10-50 ohms/square which is almost unaltered after immersion in dilute HCl for 30-120 min. The infrared reflectance predicted for the coatings is 67%-77% at a wavelength 2.5 μm, which is nearly what is experimentally observed. The coated PI has a transmittance (25-35%) peak located around 550-600 nm. These thermally stable conductive coatings on PI foils might be used as conductive substrates for optoelectronic device structures.

Controlled Deposition of Highly Ordered Soluble Acene Thin Films: Effect of Morphology and Crystal Orientation on Transistor Performance

2009 ◽  
Vol 21 (48) ◽  
pp. 4926-4931 ◽  
Author(s):  
Christoph W. Sele ◽  
B. K. Charlotte Kjellander ◽  
Bjoern Niesen ◽  
Martin J. Thornton ◽  
J. Bas P. H. van der Putten ◽  
...  
Keyword(s):  
Thin Films ◽  
Crystal Orientation ◽  
Controlled Deposition
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