Electrical breakdown characteristics of plasma-copolymerized thin films from allylamine and ethylene

1988 ◽  
Vol 108 (4) ◽  
pp. 8-19 ◽  
Author(s):  
Toshiki Nakano ◽  
Osamu Nakamura ◽  
Naoki Shibayama ◽  
Yoshimichi Omki
Keyword(s):  
Thin Films ◽  
Electrical Breakdown

MECHANISMS OF NANO-SHORTS IN THE ELECTRICAL BREAKDOWN OF FERROELECTRIC THIN FILMS

2005 ◽  
Vol 73 (1) ◽  
pp. 93-98
Author(s):  
XIAOJIE LOU ◽  
XIAOBING HU ◽  
MING ZHANG ◽  
S. A. T. REDFERN ◽  
J. F. SCOTT
Keyword(s):  
Thin Films ◽  
Electrical Breakdown ◽  
Ferroelectric Thin Films

Electrical Breakdown of Plasma-Polymerized Styrene Thin Films

1982 ◽  
Vol 21 (Part 1, No. 3) ◽  
pp. 475-482 ◽  
Author(s):  
Masayuki Hikita ◽  
Akinori Matsuda ◽  
Masayuki Nagao ◽  
Goro Sawa ◽  
Masayuki Ieda
Keyword(s):  
Thin Films ◽  
Electrical Breakdown

scholarly journals Electrical breakdown characteristics of plasma-copolymerized thin films from allylamine and ethylene.

1988 ◽  
Vol 108 (3) ◽  
pp. 103-110
Author(s):  
Toshiki Nakano ◽  
Osamu Nakamura ◽  
Naoki Shibayama ◽  
Yoshimichi Ohki
Keyword(s):  
Thin Films ◽  
Electrical Breakdown

Mechanical stress effects on electrical breakdown of freestanding GaN thin films

2018 ◽  
Vol 81 ◽  
pp. 181-185 ◽  
Author(s):  
Tun Wang ◽  
Baoming Wang ◽  
Aman Haque ◽  
Michael Snure ◽  
Eric Heller ◽  
...  
Keyword(s):  
Thin Films ◽  
Mechanical Stress ◽  
Electrical Breakdown ◽  
Stress Effects

Electrical Breakdown and Reliability of Metal Gate - La2O3 Thin Films after Post Deposition Annealing in N2

2019 ◽  
Vol 1 (5) ◽  
pp. 757-765 ◽  
Author(s):  
Joel Molina ◽  
Kazuo Tsutsui ◽  
H. Iwai ◽  
Kuniyuki Kakushima ◽  
Nobuyuki Sugii ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Breakdown ◽  
Metal Gate ◽  
Post Deposition Annealing ◽  
Post Deposition
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