Electrical Breakdown and Reliability of Metal Gate - La2O3 Thin Films after Post Deposition Annealing in N2

2019 ◽  
Vol 1 (5) ◽  
pp. 757-765 ◽  
Author(s):  
Joel Molina ◽  
Kazuo Tsutsui ◽  
H. Iwai ◽  
Kuniyuki Kakushima ◽  
Nobuyuki Sugii ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Breakdown ◽  
Metal Gate ◽  
Post Deposition Annealing ◽  
Post Deposition

scholarly journals Post-Deposition Annealing Analysis for HfO[sub 2] Thin Films Using GIXRR∕GIXRD

2009 ◽  
Author(s):  
Wei-En Fu ◽  
Yong-Qing Chang ◽  
Yi-Ching Chen ◽  
Erik M. Secula ◽  
David G. Seiler ◽  
...  
Keyword(s):  
Thin Films ◽  
Post Deposition Annealing ◽  
Post Deposition

Investigation on the Thermal and Electrical Properties of Ti-Si-O Film Formed by the Composite Sputtering Deposition

2001 ◽  
Vol 670 ◽  
Author(s):  
Akira Nishiyama ◽  
Akio Kaneko ◽  
Masato Koyama ◽  
Yoshiki Kamata ◽  
Ikuo Fujiwara ◽  
...  
Keyword(s):  
Thin Films ◽  
Dielectric Constant ◽  
Phase Separation ◽  
Nanocrystalline Film ◽  
Post Deposition Annealing ◽  
Current Increase ◽  
Sputtering Deposition ◽  
Thermal And Electrical Properties ◽  
Sputter Deposited ◽  
Post Deposition

ABSTRACTTi-Si-O films were sputter deposited from TiO2+SiO2 composite targets with various SiO2 content. The phase separation occurred for every SiO2 content used in this experiment (from 14% to 75%) and it has been revealed that nanocrystalline (TiO2)1-x(SiO2)x films in which anatase TiO2 forms tiny grains were obtained when x in the film is larger than 0.26. The tiny grain was effective for suppressing the thermal grooving phenomenon of the thin films by the post deposition annealing which leads to the leakage current increase. The dielectric constant of the nanocrystalline film was varied with the SiO2 content from the value of the bulk anatase to SiO2.

scholarly journals Effect of Post-deposition Annealing in a Nitrogen Atmosphere on the Properties of SnO2 Thin Films

2017 ◽  
Vol 30 (1) ◽  
pp. 1-5
Author(s):  
Young-Hwan Song ◽  
Tae-Young Eom ◽  
Sung-Bo Heo ◽  
Jun-Ho Kim ◽  
Daeil Kim
Keyword(s):  
Thin Films ◽  
Nitrogen Atmosphere ◽  
Post Deposition Annealing ◽  
Sno2 Thin Films ◽  
Post Deposition
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