Thin Films of ZrO2 for High-k Applications Employing Engineered Alkoxide- and Amide-Based MOCVD Precursors

2007 ◽  
Vol 13 (2-3) ◽  
pp. 98-104 ◽  
Author(s):  
R. Thomas ◽  
R. Bhakta ◽  
A. Milanov ◽  
A. Devi ◽  
P. Ehrhart
Keyword(s):  
Thin Films ◽  
High K ◽  
Mocvd Precursors

Thin Films of HfO[sub 2] for High-k Gate Oxide Applications from Engineered Alkoxide- and Amide-Based MOCVD Precursors

2007 ◽  
Vol 154 (3) ◽  
pp. G77 ◽  
Author(s):  
Reji Thomas ◽  
Eduard Rije ◽  
Peter Ehrhart ◽  
Andrian Milanov ◽  
Raghunandan Bhakta ◽  
...  
Keyword(s):  
Thin Films ◽  
Gate Oxide ◽  
High K ◽  
Mocvd Precursors

Characteristics of Nickel Oxide Modified Zr-Doped HfO2 High-k Thin Films

2021 ◽  
Vol MA2021-02 (12) ◽  
pp. 626-626
Author(s):  
Chia-Han Yang ◽  
Yue Kuo
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
High K

scholarly journals Atomic scale microstructures of high-k HfSiO thin films fabricated by magnetron sputtering

2012 ◽  
Vol 177 (10) ◽  
pp. 717-720 ◽  
Author(s):  
Etienne Talbot ◽  
Manuel Roussel ◽  
Larysa Khomenkova ◽  
Fabrice Gourbilleau ◽  
Philippe Pareige
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Atomic Scale ◽  
High K

Investigation of strontium tantalate thin films for high-k gate dielectric applications

2006 ◽  
Vol 9 (6) ◽  
pp. 1102-1107 ◽  
Author(s):  
M. Silinskas ◽  
M. Lisker ◽  
B. Kalkofen ◽  
E.P. Burte
Keyword(s):  
Thin Films ◽  
Gate Dielectric ◽  
High K ◽  
High K Gate Dielectric

A Simple Route to the Synthesis of Pr2O3 High-k Thin Films

2003 ◽  
Vol 15 (13) ◽  
pp. 1071-1075 ◽  
Author(s):  
R. Lo Nigro ◽  
R.G. Toro ◽  
G. Malandrino ◽  
V. Raineri ◽  
I.L. Fragalà
Keyword(s):  
Thin Films ◽  
Simple Route ◽  
High K

Characteristics of Nickel Oxide Modified Zr-Doped HfO2 High-k Thin Films

2021 ◽  
Vol 104 (3) ◽  
pp. 63-67
Author(s):  
Chia-Han Yang ◽  
Yue Kuo
Keyword(s):  
Thin Films ◽  
Nickel Oxide ◽  
High K
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