Electron and Negative Ion Analysis in Oxygen Capacitively Coupled Radio Frequency Plasma

J. Meichsner; K. Dittmann; C. Küllig

doi:10.1002/ctpp.201210052

Electron and Negative Ion Analysis in Oxygen Capacitively Coupled Radio Frequency Plasma

Contributions to Plasma Physics ◽

10.1002/ctpp.201210052 ◽

2012 ◽

Vol 52 (7) ◽

pp. 561-570 ◽

Cited By ~ 9

Author(s):

J. Meichsner ◽

K. Dittmann ◽

C. Küllig

Keyword(s):

Radio Frequency ◽

Negative Ion ◽

Radio Frequency Plasma ◽

Capacitively Coupled ◽

Frequency Plasma ◽

Ion Analysis

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Influence of finite geometrical asymmetry of the electrodes in capacitively coupled radio frequency plasma

Physics of Plasmas ◽

10.1063/1.4893148 ◽

2014 ◽

Vol 21 (8) ◽

pp. 083509 ◽

Cited By ~ 15

Author(s):

B. Bora ◽

L. Soto

Keyword(s):

Radio Frequency ◽

Radio Frequency Plasma ◽

Capacitively Coupled ◽

Frequency Plasma

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Observations of Electron Energy Distribution Functions and Ion Bombardment Secondary Electrons in a Capacitively Coupled Radio Frequency Plasma

IEEJ Transactions on Fundamentals and Materials ◽

10.1541/ieejfms1990.119.6_866 ◽

1999 ◽

Vol 119 (6) ◽

pp. 866-871 ◽

Cited By ~ 1

Author(s):

Yasunori Ohtsu ◽

Hiroharu Fujita

Keyword(s):

Energy Distribution ◽

Radio Frequency ◽

Electron Energy ◽

Distribution Functions ◽

Radio Frequency Plasma ◽

Electron Energy Distribution ◽

Secondary Electrons ◽

Capacitively Coupled ◽

Frequency Plasma ◽

Energy Distribution Functions

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On the role of secondary electron emission in capacitively coupled radio‐frequency plasma sheath: A theoretical ground

Plasma Processes and Polymers ◽

10.1002/ppap.201900093 ◽

2019 ◽

Vol 16 (11) ◽

pp. 1900093 ◽

Cited By ~ 2

Author(s):

Guang‐Yu Sun ◽

Han‐Wei Li ◽

An‐Bang Sun ◽

Yuan Li ◽

Bai‐Peng Song ◽

...

Keyword(s):

Radio Frequency ◽

Electron Emission ◽

Secondary Electron ◽

Secondary Electron Emission ◽

Plasma Sheath ◽

Theoretical Ground ◽

Radio Frequency Plasma ◽

Capacitively Coupled ◽

Frequency Plasma

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Negative‐ion extraction of gaseous materials from a radio frequency plasma‐sputter‐type heavy negative‐ion source

Review of Scientific Instruments ◽

10.1063/1.1146800 ◽

1996 ◽

Vol 67 (3) ◽

pp. 1012-1015 ◽

Cited By ~ 7

Author(s):

Hiroshi Tsuji ◽

Junzo Ishikawa ◽

Tetsuo Tomita ◽

Yasuhito Gotoh

Keyword(s):

Radio Frequency ◽

Ion Source ◽

Negative Ion ◽

Radio Frequency Plasma ◽

Ion Extraction ◽

Frequency Plasma

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Corrigendum: Studies on the effect of finite geometrical asymmetry in dual capacitively coupled radio frequency plasma (2015 Plasma Sources Sci. Technol. 24 054002)

Plasma Sources Science and Technology ◽

10.1088/0963-0252/24/6/069501 ◽

2015 ◽

Vol 24 (6) ◽

pp. 069501

Author(s):

B Bora

Keyword(s):

Radio Frequency ◽

Radio Frequency Plasma ◽

Plasma Sources ◽

Capacitively Coupled ◽

Frequency Plasma

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A comparative investigation of some analytical performance characteristics of an inductively-coupled radio frequency plasma and a capacitively-coupled microwave plasma for solution analysis by emission spectrometry

Spectrochimica Acta Part B Atomic Spectroscopy ◽

10.1016/0584-8547(75)80040-1 ◽

1975 ◽

Vol 30 (10-11) ◽

pp. 449-469 ◽

Cited By ~ 70

Author(s):

P.W.J.M. Boumans ◽

F.J. de Boer ◽

F.J. Dahmen ◽

H. Hoelzel ◽

A. Meier

Keyword(s):

Radio Frequency ◽

Microwave Plasma ◽

Comparative Investigation ◽

Performance Characteristics ◽

Analytical Performance ◽

Emission Spectrometry ◽

Radio Frequency Plasma ◽

Capacitively Coupled ◽

Inductively Coupled ◽

Frequency Plasma

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Hydrophobic over-recovery during aging of polyethylene modified by oxygen capacitively coupled radio frequency plasma: A new approach for stable superhydrophobic surface with high water adhesion

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2012.05.120 ◽

2012 ◽

Vol 206 (23) ◽

pp. 4952-4958 ◽

Cited By ~ 20

Author(s):

Y.P. Li ◽

S.Y. Li ◽

W. Shi ◽

M.K. Lei

Keyword(s):

Radio Frequency ◽

Superhydrophobic Surface ◽

High Water ◽

Radio Frequency Plasma ◽

New Approach ◽

Capacitively Coupled ◽

Frequency Plasma ◽

Water Adhesion

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A Novel Sustaining Mechanism in Capacitively Coupled Radio Frequency Plasma in Oxygen

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.4182 ◽

1998 ◽

Vol 37 (Part 1, No. 7A) ◽

pp. 4182-4185 ◽

Cited By ~ 9

Author(s):

Mari Shibata ◽

Toshiaki Makabe ◽

Nobuhiko Nakano

Keyword(s):

Radio Frequency ◽

Radio Frequency Plasma ◽

Capacitively Coupled ◽

Frequency Plasma

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Extraction of molecular negative-ion beams of CN from radio frequency plasma-sputter-type heavy negative ion source for negative-ion beam deposition

Review of Scientific Instruments ◽

10.1063/1.1148628 ◽

1998 ◽

Vol 69 (2) ◽

pp. 884-886 ◽

Cited By ~ 4

Author(s):

Hiroshi Tsuji ◽

Junzo Ishikawa ◽

Tetsuo Tomita ◽

Takaaki Yoshihara ◽

Yasuhito Gotoh

Keyword(s):

Radio Frequency ◽

Ion Beam ◽

Ion Beams ◽

Ion Source ◽

Negative Ion ◽

Radio Frequency Plasma ◽

Ion Beam Deposition ◽

Frequency Plasma ◽

Beam Deposition

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Diagnostic of Capacitively Coupled Low Pressure Radio Frequency Plasma: An Approach through Electrical Discharge Characteristic

International Journal of Applied Physics and Mathematics ◽

10.7763/ijapm.2011.v1.24 ◽

2011 ◽

pp. 124-128 ◽

Cited By ~ 8

Author(s):

B. Bora ◽

H. Bhuyan ◽

M. Favre ◽

E. Wyndham ◽

H. Chuaqui

Keyword(s):

Radio Frequency ◽

Electrical Discharge ◽

Low Pressure ◽

Radio Frequency Plasma ◽

Discharge Characteristic ◽

Capacitively Coupled ◽

Frequency Plasma

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