Paschen Curve and Film Growth in Low Pressure Capacitively Coupled Magnetron Plasma Polymerization

2012 ◽  
Vol 52 (4) ◽  
pp. 283-288 ◽  
Author(s):  
L. Ledernez ◽  
F. Olcaytug ◽  
G. Urban
Keyword(s):  
Plasma Polymerization ◽  
Film Growth ◽  
Low Pressure ◽  
Capacitively Coupled ◽  
Paschen Curve

An overview of diagnostic methods of low-pressure capacitively coupled plasmas

2012 ◽  
Vol 521 ◽  
pp. 141-145 ◽  
Author(s):  
Yong-Xin Liu ◽  
Wei Jiang ◽  
Xiao-Song Li ◽  
Wen-Qi Lu ◽  
You-Nian Wang
Keyword(s):  
Low Pressure ◽  
Diagnostic Methods ◽  
Capacitively Coupled ◽  
Coupled Plasmas

Impact of low-pressure glow-discharge-pulsed plasma polymerization on properties of polyaniline thin films

2016 ◽  
Vol 91 (12) ◽  
pp. 125501 ◽  
Author(s):  
Aviraj A Jatratkar ◽  
Jyotiprakash B Yadav ◽  
R R Deshmukh ◽  
Harish C Barshilia ◽  
Vijaya Puri ◽  
...  
Keyword(s):  
Thin Films ◽  
Glow Discharge ◽  
Plasma Polymerization ◽  
Low Pressure ◽  
Pulsed Plasma ◽  
Pressure Glow Discharge ◽  
Pulsed Plasma Polymerization

scholarly journals Diagnostics of low-pressure capacitively coupled RF discharge argon plasma

2019 ◽  
Vol 13 (27) ◽  
pp. 76-82
Author(s):  
Kadhim A. Aadim
Keyword(s):  
Electron Temperature ◽  
Electron Density ◽  
Langmuir Probe ◽  
Gas Flow ◽  
Low Pressure ◽  
Gas Pressure ◽  
Rf Discharge ◽  
Electrode Gap ◽  
Probe Characteristic ◽  
Capacitively Coupled

Low-pressure capacitively coupled RF discharge Ar plasma has been studied using Langmuir probe. The electron temperature, electron density and Debay length were calculated under different pressures and electrode gap. In this work the RF Langmuir probe is designed using 4MHz filter as compensation circuit and I-V probe characteristic have been investigated. The pressure varied from 0.07 mbar to 0.1 mbar while electrode gap varied from 2-5 cm. The plasma was generated using power supply at 4MHz frequency with power 300 W. The flowmeter is used to control Argon gas flow in the range of 600 standard cubic centimeters per minute (sccm). The electron temperature drops slowly with pressure and it's gradually decreased when expanding the electrode gap. As the gas pressure increases, the plasma density rises slightly at low gas pressure while it drops little at higher gas pressure. The electron density decreases rapidly with expand distances between electrodes.

scholarly journals Electron power absorption in low pressure capacitively coupled electronegative oxygen radio frequency plasmas

2020 ◽  
Vol 29 (2) ◽  
pp. 025019 ◽  
Author(s):  
Máté Vass ◽  
Sebastian Wilczek ◽  
Trevor Lafleur ◽  
Ralf Peter Brinkmann ◽  
Zoltán Donkó ◽  
...  
Keyword(s):  
Radio Frequency ◽  
Low Pressure ◽  
Power Absorption ◽  
Capacitively Coupled
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