Erosion Behaviour of Metal-Doped Carbon Layers in Deuterium Low Pressure Plasmas and the Determination by Optical Emission Spectroscopy

2007 ◽  
Vol 47 (7) ◽  
pp. 530-536 ◽  
Author(s):  
P. Starke ◽  
C. Adelhelm ◽  
M. Balden
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Low Pressure ◽  
Erosion Behaviour ◽  
Metal Doped

Characterization of a low-pressure argon plasma using optical emission spectroscopy and a global model

2007 ◽  
Vol 101 (5) ◽  
pp. 053306 ◽  
Author(s):  
A. Palmero ◽  
E. D. van Hattum ◽  
H. Rudolph ◽  
F. H. P. M. Habraken
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Argon Plasma ◽  
Optical Emission ◽  
Low Pressure ◽  
Global Model

scholarly journals Effect of the O2 dissociation degree on the rate of anodic evaporation of Al in a low-pressure arc

2021 ◽  
Vol 2064 (1) ◽  
pp. 012048
Author(s):  
A S Kamenetskikh ◽  
N V Gavrilov ◽  
S V Krivoshapko ◽  
P V Tretnikov ◽  
A V Chukin
Keyword(s):  
Oxide Film ◽  
Emission Spectroscopy ◽  
Gas Flow ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Low Pressure ◽  
Dissociation Degree ◽  
Accelerated Growth ◽  
Discharge Gap ◽  
O2 Dissociation

Abstract The results of probe diagnostics and optical emission spectroscopy of Ar-O2 plasma of a low-pressure arc generated under anodic evaporation of Al and an increased (0.32 – 0.48) degree of O2 dissociation are presented. It is shown that an increase in the degree of O2 dissociation at a constant gas flow into the discharge gap leads to a significant (more than 1.5 times) decrease in the density of the evaporated atoms flux and a corresponding decrease in the coating deposition rate. The observed effect is due to the accelerated growth of the oxide film on the melt surface, which leads to the limitation of the flow of evaporated Al atoms by the rate of diffusion through the alumina.

Optical Emission Spectroscopy-Based Tomography for Compact Low-Pressure Microwave Plasma in a Multicusp

2017 ◽  
Vol 45 (9) ◽  
pp. 2492-2503 ◽  
Author(s):  
Kavita Rathore ◽  
Sudeep Bhattacharjee ◽  
Dudh Nath Patel ◽  
Prabhat Munshi
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Microwave Plasma ◽  
Optical Emission ◽  
Low Pressure
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