A Linear Model for the Interpretation of Optical Emission Spectroscopy Measurements in Low Pressure DC Magnetron Sputtering

1997 ◽  
Vol 37 (6) ◽  
pp. 483-497 ◽  
Author(s):  
J. Schulte ◽  
G. Sobe ◽  
G. Reiss
Keyword(s):  
Magnetron Sputtering ◽  
Linear Model ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Low Pressure ◽  
Dc Magnetron Sputtering

Correlation Between In Situ Optical Emission Spectroscopy in a Reactive O2 / AR RF Magnetron Sputtering Discharge and PZT Thin Film Composition

1997 ◽  
Vol 493 ◽  
Author(s):  
F. Ayguavives ◽  
P. Aubert ◽  
B. Ea-Kim ◽  
B. Agius
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Optical Emission ◽  
Rf Magnetron Sputtering ◽  
Nuclear Reaction Analysis ◽  
Nominal Composition ◽  
Film Composition

ABSTRACTLead zirconate titanate (PZT) thin films have been grown by rf magnetron sputtering on Si substrates from a metallic target of nominal composition Pb1.1(Zr0.4 Ti0.6 in a reactive argon / oxygen gas mixture. During plasma deposition, in situ Optical Emission Spectroscopy (OES) measurements show clearly a correlation between the evolution of characteristic atomic emission line intensities (Zr - 386.4 nm, Ti - 399.9 nm, Pb - 405.8 nm and O - 777.2 nm) and the thin-film composition determined by a simultaneous use of Rutherford Backscattering Spectroscopy (RBS) and Nuclear Reaction Analysis (NRA).

Characterization of a low-pressure argon plasma using optical emission spectroscopy and a global model

2007 ◽  
Vol 101 (5) ◽  
pp. 053306 ◽  
Author(s):  
A. Palmero ◽  
E. D. van Hattum ◽  
H. Rudolph ◽  
F. H. P. M. Habraken
Keyword(s):  
Emission Spectroscopy ◽  
Optical Emission Spectroscopy ◽  
Argon Plasma ◽  
Optical Emission ◽  
Low Pressure ◽  
Global Model
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