Control of Thickness and Chemical Properties of Atomic Layer Deposition Overcoats for Stabilizing Cu/γ-Al2O3Catalysts

ChemSusChem ◽  
2014 ◽  
Vol 7 (12) ◽  
pp. 3247-3251 ◽  
Author(s):  
Brandon J. O'Neill ◽  
Canan Sener ◽  
David H. K. Jackson ◽  
Thomas F. Kuech ◽  
James A. Dumesic
Keyword(s):  
Atomic Layer Deposition ◽  
Chemical Properties ◽  
Atomic Layer ◽  
Layer Deposition ◽  
And Chemical Properties

scholarly journals Atomic Layer Deposition of Cerium Dioxide Film on TiN and Si Substrates: Structural and Chemical Properties

MRS Advances ◽  
2017 ◽  
Vol 2 (52) ◽  
pp. 3005-3010 ◽  
Author(s):  
Silvia Vangelista ◽  
Rossella Piagge ◽  
Satu Ek ◽  
Tiina Sarnet ◽  
Gabriella Ghidini ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Photoelectron Spectroscopy ◽  
Cerium Dioxide ◽  
Relative Concentration ◽  
Chemical Properties ◽  
Atomic Layer ◽  
Si Substrates ◽  
Layer Deposition ◽  
Dioxide Film ◽  
And Chemical Properties

ABSTRACTCerium dioxide (CeO2) thin films were deposited by atomic layer deposition (ALD) on both Si and TiN substrates. The ALD growth produces CeO2 cubic polycrystalline films on both substrates. However, the films show a preferential orientation along <200> crystallographic direction for CeO2/Si or <111> for CeO2/TiN. In correspondence, we measure a relative concentration of Ce3+ equals to 22.0% in CeO2/Si and around 18% in CeO2/TiN, by X-ray photoelectron spectroscopy. Such values indicate the presence of oxygen vacancies in the films. Our results underline the films differences and similarities between ALD-deposited CeO2 either on Si or TiN substrates, thus extending the knowledge on the CeO2 structural and chemical properties.

scholarly journals Atomic Layer Deposition for Preparation of Highly Efficient Catalysts for Dry Reforming of Methane

Catalysts ◽  
2019 ◽  
Vol 9 (3) ◽  
pp. 266 ◽  
Author(s):  
Soong Kim ◽  
Byeong Cha ◽  
Shahid Saqlain ◽  
Hyun Seo ◽  
Young Kim
Keyword(s):  
Atomic Layer Deposition ◽  
Heterogeneous Catalysts ◽  
Chemical Properties ◽  
Atomic Layer ◽  
Dry Reforming ◽  
Dry Reforming Of Methane ◽  
High Catalytic Activity ◽  
Term Operation ◽  
Layer Deposition

In this article, the structural and chemical properties of heterogeneous catalysts prepared by atomic layer deposition (ALD) are discussed. Oxide shells can be deposited on metal particles, forming shell/core type catalysts, while metal nanoparticles are incorporated into the deep inner parts of mesoporous supporting materials using ALD. Both structures were used as catalysts for the dry reforming of methane (DRM) reaction, which converts CO2 and CH4 into CO and H2. These ALD-prepared catalysts are not only highly initially active for the DRM reaction but are also stable for long-term operation. The origins of the high catalytic activity and stability of the ALD-prepared catalysts are thoroughly discussed.

scholarly journals Atomic-Scale Structure and its Impact on Chemical Properties of Aluminum Oxide Layers Prepared by Atomic Layer Deposition on Silica

2021 ◽  
Author(s):  
Monu Kaushik ◽  
César Leroy ◽  
Zixuan Chen ◽  
David Gajan ◽  
Elena Willinger ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Chemical Properties ◽  
Atomic Layer ◽  
Acid Sites ◽  
Scale Structure ◽  
Atomic Scale ◽  
Oxide Layers ◽  
Al Content ◽  
Layer Deposition ◽  
Atomic Scale Structure

We report the atomic-scale structure of alumina layers obtained by atomic layer deposition (ALD) of trimethylaluminium onto partially dehydroxylated silica. Such a detailed insight into the atomic structure of the species formed with increasing Al content was gained using a variety of one- and two-dimensional solid-state nuclear magnetic resonance (NMR) experiments involving <sup>27</sup>Al, <sup>1</sup>H and <sup>29</sup>Si nuclei. <sup>15</sup>N dynamic nuclear polarization surface-enhanced NMR spectroscopy (<sup>15</sup>N DNP SENS) and infrared spectroscopy using <sup>15</sup>N-labelled pyridine as a probe molecule reveal that aluminium oxide layers on amorphous silica contain both strong Bronsted and strong Lewis acid sites, whereby the relative abundance and nature of these sites, and therefore the acidity of the surface, evolve with increasing thickness of the alumina film. <br>

Atomic layer deposition of Y2O3 films using heteroleptic liquid (iPrCp)2Y(iPr-amd) precursor

2014 ◽  
Vol 2 (43) ◽  
pp. 9240-9247 ◽  
Author(s):  
In-Sung Park ◽  
Yong Chan Jung ◽  
Sejong Seong ◽  
Jinho Ahn ◽  
Jiehun Kang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Resistive Switching ◽  
Material Characterization ◽  
Chemical Properties ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition ◽  
Deposited Film

The Y2O3 films grown with a new and heteroleptic liquid Y precursor, (iPrCp)2Y(iPr-amd), have been investigated with chemical properties of precursor, atomic layer deposition process, and material characterization of the deposited film and its non-volatile resistive switching behaviour.

scholarly journals Effect of an electric field during the deposition of silicon dioxide thin films by plasma enhanced atomic layer deposition: an experimental and computational study

Nanoscale ◽  
2020 ◽  
Vol 12 (3) ◽  
pp. 2089-2102 ◽  
Author(s):  
Vivek Beladiya ◽  
Martin Becker ◽  
Tahsin Faraz ◽  
W. M. M. (Erwin) Kessels ◽  
Paul Schenk ◽  
...  
Keyword(s):  
Thin Films ◽  
Electric Field ◽  
Silicon Dioxide ◽  
Computational Study ◽  
Chemical Properties ◽  
Atomic Layer ◽  
Physical And Chemical Properties ◽  
Layer Deposition ◽  
Physical And Chemical ◽  
And Chemical Properties

PEALD of thin SiO2 films assisted by bias is a powerful technique to tailor their physical and chemical properties.

Atomic layer deposition of biobased nanostructured interfaces for energy, environmental and health applications

2015 ◽  
Vol 87 (8) ◽  
pp. 751-758 ◽  
Author(s):  
Mikhael Bechelany ◽  
Sebastien Balme ◽  
Philippe Miele
Keyword(s):  
Water Treatment ◽  
Atomic Layer Deposition ◽  
Nanostructured Materials ◽  
Chemical Properties ◽  
Atomic Layer ◽  
Physical Chemical ◽  
Control Interface ◽  
Layer Deposition ◽  
Nanostructured Interfaces ◽  
Health Applications

AbstractThe most fundamental phenomena in the immobilising of biomolecules on the nanostructured materials for energy, environmental and health applications are the control of interfaces between the nanostructures/nanopores and the immobilized biomaterials. Thus, the throughput of all those biobased nanostructured materials and devices can be improved or controlled by the enhanced geometric area of the nanostructured interfaces if an efficient immobilization of the biomolecules is warranted. In this respect, an accurate control of the geometry (size, porosity, etc.) and interfaces is primordial to finding the delicate balance between large/control interface areas and good immobilization conditions. Here, we will show how the atomic layer deposition (ALD) can be used as a tool for the creation of controlled nanostructured interfaces in which the geometry can be tuned accurately and the dependence of the physical-chemical properties on the geometric parameters can be studied systematically in order to immobilize biomolecules. We will show mainly examples of how these methods can be used to create single nanopores for mass spectroscopy and DNA sequencing, and membrane for gas separation and water treatment in which the performance varies with the nanostructure morphologies/interfaces and the immobilization conditions.

scholarly journals Atomic-Scale Structure and its Impact on Chemical Properties of Aluminum Oxide Layers Prepared by Atomic Layer Deposition on Silica

2021 ◽  
Author(s):  
Monu Kaushik ◽  
César Leroy ◽  
Zixuan Chen ◽  
David Gajan ◽  
Elena Willinger ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Chemical Properties ◽  
Atomic Layer ◽  
Acid Sites ◽  
Scale Structure ◽  
Atomic Scale ◽  
Oxide Layers ◽  
Al Content ◽  
Layer Deposition ◽  
Atomic Scale Structure

We report the atomic-scale structure of alumina layers obtained by atomic layer deposition (ALD) of trimethylaluminium onto partially dehydroxylated silica. Such a detailed insight into the atomic structure of the species formed with increasing Al content was gained using a variety of one- and two-dimensional solid-state nuclear magnetic resonance (NMR) experiments involving <sup>27</sup>Al, <sup>1</sup>H and <sup>29</sup>Si nuclei. <sup>15</sup>N dynamic nuclear polarization surface-enhanced NMR spectroscopy (<sup>15</sup>N DNP SENS) and infrared spectroscopy using <sup>15</sup>N-labelled pyridine as a probe molecule reveal that aluminium oxide layers on amorphous silica contain both strong Bronsted and strong Lewis acid sites, whereby the relative abundance and nature of these sites, and therefore the acidity of the surface, evolve with increasing thickness of the alumina film. <br>

Physical/chemical properties of tin oxide thin film transistors prepared using plasma-enhanced atomic layer deposition

2012 ◽  
Vol 47 (10) ◽  
pp. 3052-3055 ◽  
Author(s):  
Byung Kook Lee ◽  
Eunae Jung ◽  
Seok Hwan Kim ◽  
Dae Chul Moon ◽  
Sun Sook Lee ◽  
...  
Keyword(s):  
Thin Film ◽  
Atomic Layer Deposition ◽  
Tin Oxide ◽  
Thin Film Transistors ◽  
Chemical Properties ◽  
Atomic Layer ◽  
Oxide Thin Film ◽  
Physical Chemical ◽  
Layer Deposition
Sign in / Sign up

Export Citation Format

Share Document