Atomic layer deposition of Y2O3 films using heteroleptic liquid (iPrCp)2Y(iPr-amd) precursor

2014 ◽  
Vol 2 (43) ◽  
pp. 9240-9247 ◽  
Author(s):  
In-Sung Park ◽  
Yong Chan Jung ◽  
Sejong Seong ◽  
Jinho Ahn ◽  
Jiehun Kang ◽  
...  
Keyword(s):  
Atomic Layer Deposition ◽  
Resistive Switching ◽  
Material Characterization ◽  
Chemical Properties ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition ◽  
Deposited Film

The Y2O3 films grown with a new and heteroleptic liquid Y precursor, (iPrCp)2Y(iPr-amd), have been investigated with chemical properties of precursor, atomic layer deposition process, and material characterization of the deposited film and its non-volatile resistive switching behaviour.

Characterization of radical-enhanced atomic layer deposition process based on microwave surface wave generated plasma

2021 ◽  
Vol 130 (1) ◽  
pp. 013301
Author(s):  
Drahoslav Tvarog ◽  
Jiří Olejníček ◽  
Jiří Kratochvíl ◽  
Petra Kšírová ◽  
Aleš Poruba ◽  
...  
Keyword(s):  
Surface Wave ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

scholarly journals In Situ SiO2 Passivation of Epitaxial (100) and (110)InGaAs by Exploiting TaSiOx Atomic Layer Deposition Process

ACS Omega ◽  
2018 ◽  
Vol 3 (11) ◽  
pp. 14567-14574 ◽  
Author(s):  
Mantu K. Hudait ◽  
Michael B. Clavel ◽  
Jheng-Sin Liu ◽  
Shuvodip Bhattacharya
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Al 2 O 3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

2019 ◽  
Vol 217 (8) ◽  
pp. 1900237
Author(s):  
Zhen Zhu ◽  
Saoussen Merdes ◽  
Oili M. E. Ylivaara ◽  
Kenichiro Mizohata ◽  
Mikko J. Heikkilä ◽  
...  
Keyword(s):  
Thin Films ◽  
Low Temperature ◽  
Atomic Layer Deposition ◽  
Thermal Plasma ◽  
Atomic Layer ◽  
Deposition Process ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition

Optical in situ monitoring of plasma-enhanced atomic layer deposition process

2018 ◽  
Vol 57 (6S2) ◽  
pp. 06JF05 ◽  
Author(s):  
Muhammad Zeeshan Arshad ◽  
Kyung Jae Jo ◽  
Hyun Gi Kim ◽  
Sang Jeen Hong
Keyword(s):  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Deposition Process ◽  
In Situ Monitoring ◽  
Atomic Layer Deposition Process ◽  
Layer Deposition
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