Material characterization of a high-dielectric-constant polymer-ceramic composite for embedded capacitor for RF applications

2004 ◽  
Vol 92 (4) ◽  
pp. 2228-2231 ◽  
Author(s):  
Yang Rao ◽  
C. P. Wong
Keyword(s):  
Dielectric Constant ◽  
Material Characterization ◽  
Ceramic Composite ◽  
High Dielectric Constant ◽  
Embedded Capacitor ◽  
Rf Applications ◽  
High Dielectric

scholarly journals Material Characterization of High Dielectric Constant Polymer–Ceramic Composite for Embedded Capacitor to RF Application

2002 ◽  
Vol 25 (1) ◽  
pp. 123-129 ◽  
Author(s):  
Yang Rao ◽  
Jireh Yue ◽  
C. P. Wong
Keyword(s):  
Dielectric Constant ◽  
Breakdown Voltage ◽  
Ceramic Composite ◽  
High Dielectric Constant ◽  
Ceramic Composites ◽  
Nano Composite ◽  
Capacitance Density ◽  
High Breakdown Voltage ◽  
Embedded Capacitor ◽  
High Dielectric

Embedded capacitor technology can improve electrical performance and reduce assembly cost compared with traditional discrete capacitor technology. Polymer–ceramic composites have been of great interest as embedded capacitor material because they combine the processability of polymers with the desired electrical properties of ceramics. A novel nano-structure polymer–ceramic composite with very high dielectric constant (εr∼150, a new record for the highest reportedεrvalue of nano-composite) has been developed in our previous work. RF application of embedded capacitors requires that insulating material have high dielectric constant at high frequency (GHz), low leakage current, high breakdown voltage and high reliability. A set of electrical tests have been conducted in this work to characterize the properties of the in house developed novel high dielectric constant polymer–ceramic nano-composite. Results show that this material has faily high dielectric constant in the RF range, low electrical leakage and high breakdown voltage. 85/85 TH aging test has been performed and it had shown this novel high K material has good reliability. An embedded capacitor prototype with capacitance density of35 nF/cm2has been manufactured using this nano-composite with spinning coating technology. This novel nano-composite can be used for the integral capacitors in the RF applications.

Optical properties and band gap characterization of high dielectric constant oxides

2012 ◽  
Vol 520 (14) ◽  
pp. 4532-4535 ◽  
Author(s):  
O. Fursenko ◽  
J. Bauer ◽  
G. Lupina ◽  
P. Dudek ◽  
M. Lukosius ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
Optical Properties ◽  
Band Gap ◽  
High Dielectric Constant ◽  
High Dielectric

Pulsed DC Magnetron Sputtered Rutile TiO2 films for next generation DRAM capacitors

2013 ◽  
Vol 1561 ◽  
Author(s):  
M.A Jithin ◽  
Lakshmi Ganapathi Kolla ◽  
Navakanta Bhat ◽  
S. Mohan ◽  
Yuichiro Morozumi ◽  
...  
Keyword(s):  
Dielectric Constant ◽  
High Dielectric Constant ◽  
Low Dielectric Constant ◽  
Si Substrate ◽  
Capacitance Density ◽  
Low Dielectric ◽  
Pulsed Dc ◽  
High Dielectric ◽  
Mim Capacitors

ABSTRACTIn this study, synthesis and characterization of rutile-Titanium dioxide (TiO2) thin films using pulsed DC Magnetron Sputtering at room temperature, along with the fabrication and characterization of MIM capacitors have been discussed. XPS and RBS data show that the films are stoichiometric and have compositional uniformity. The influence of electrode materials on electrical characteristics of the fabricated MIM capacitors has been studied. The Al/TiO2/Al based capacitors show low capacitance density (9 fF/μm2) with low dielectric constant (K=25) and high EOT (3.67 nm) due to low dielectric constant TiO2 phase formation on Al/Si substrate. On the other hand, Ru/TiO2/Ru based capacitors show high capacitance density (49 fF/μm2) with high dielectric constant (K=130) and low EOT (0.7nm) values at high frequency (100 KHz) due to high dielectric constant phase (rutile) formation of TiO2, on Ru/Si substrate. Raman spectra confirm that the films deposited on Ru/Si substrate show the rutile phase.

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