Nanometer Scale Alignment of Block-Copolymer Domains by Means of a Scanning Probe Tip

2014 ◽  
Vol 26 (19) ◽  
pp. 2999-3002 ◽  
Author(s):  
Jonathan R. Felts ◽  
M. Serdar Onses ◽  
John A. Rogers ◽  
William P. King
Keyword(s):  
Block Copolymer ◽  
Scanning Probe ◽  
Nanometer Scale

A Study of the Photoelectric Effect Caused by a Laser Beam Used in a Beam Bounce Technique in a C-AFM System

2008 ◽  
Author(s):  
Hung-Sung Lin ◽  
Mong-Sheng Wu
Keyword(s):  
Laser Beam ◽  
Failure Analysis ◽  
Atomic Force Microscope ◽  
Photoelectric Effect ◽  
Scanning Probe ◽  
Nanometer Scale ◽  
Electrical Characteristics ◽  
Atomic Force ◽  
Probe Microscope ◽  
Probe Head

Abstract The use of a scanning probe microscope (SPM), such as a conductive atomic force microscope (C-AFM) has been widely reported as a method of failure analysis in nanometer scale science and technology [1-6]. A beam bounce technique is usually used to enable the probe head to measure extremely small movements of the cantilever as it is moved across the surface of the sample. However, the laser beam used for a beam bounce also gives rise to the photoelectric effect while we are measuring the electrical characteristics of a device, such as a pn junction. In this paper, the photocurrent for a device caused by photon illumination was quantitatively evaluated. In addition, this paper also presents an example of an application of the C-AFM as a tool for the failure analysis of trap defects by taking advantage of the photoelectric effect.

Algorithms for Dynamic Hardness Measurements by Scratch Testing in the Submicron and Nanometer Scale

2013 ◽  
Vol 853 ◽  
pp. 619-624
Author(s):  
Natalia Lvova ◽  
K. Kravchuk ◽  
I. Shirokov
Keyword(s):  
Contact Area ◽  
Scanning Probe Microscopy ◽  
Scanning Probe ◽  
Nanometer Scale ◽  
Geometrical Parameters ◽  
Scratch Testing ◽  
Dynamic Hardness ◽  
Probe Microscopy ◽  
Parameters Analysis

The automatic scratch geometrical parameters analysis algorithms based on the images obtained by scanning probe microscopy have been developed. We provide a description of the technique to determine the contact area and the scratch volume with and without account of the pile-ups. The developed algorithms are applied to measure the dynamic hardness by sclerometry on the submicron and nanometer scale.

Charge-based scanning probe readback of nanometer-scale ferroelectric domain patterns at megahertz rates

2009 ◽  
Vol 20 (22) ◽  
pp. 225501 ◽  
Author(s):  
Martin G Forrester ◽  
Joachim W Ahner ◽  
Mark D Bedillion ◽  
Cedric Bedoya ◽  
Dierk G Bolten ◽  
...  
Keyword(s):  
Ferroelectric Domain ◽  
Scanning Probe ◽  
Nanometer Scale

Spontaneous formation of nanometer scale tubular vesicles in aqueous mixtures of lipid and block copolymer amphiphiles

Soft Matter ◽  
2017 ◽  
Vol 13 (6) ◽  
pp. 1107-1115 ◽  
Author(s):  
Seng Koon Lim ◽  
Andrew S. W. Wong ◽  
Hans-Peter M. de Hoog ◽  
Padmini Rangamani ◽  
Atul N. Parikh ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Nanometer Scale ◽  
Aqueous Mixtures ◽  
Spontaneous Formation

Laser Induced Nanofabrication on Titanium Thin Films

1995 ◽  
Vol 397 ◽  
Author(s):  
B.D. Huey ◽  
D.A. Bonnell ◽  
A.D. Akhsakhalian ◽  
A.A. Gorbunov ◽  
A. Sewing ◽  
...  
Keyword(s):  
Thin Films ◽  
Scanning Probe Microscopy ◽  
Optical Resolution ◽  
Diffraction Limit ◽  
Scanning Probe ◽  
Nanometer Scale ◽  
Ion Laser ◽  
Titanium Thin Films ◽  
Novel Structures ◽  
Argon Ion

ABSTRACTIllumination of titanium thin films with an argon-ion laser has been used to fabricate nanometer scale features by localized oxidation. The laser induces a temperature gradient in the metal film, within which oxidation may occur. Due to the non-linearity of the reaction with temperature, the reaction zone can be laterally confined to regions narrower than the diffraction limit of optical resolution. Scanning probe microscopy indicates widths ranging from 105 to 600 nm and heights of 0.8 to 30 nm. The possibility of forming novel structures is demonstrated.

Spm Based Lithography for Nanometer Scale Electrodes Fabrication

1999 ◽  
Vol 584 ◽  
Author(s):  
A. Notargiacomo ◽  
E. Giovine ◽  
E. Cianci ◽  
V. Foglietti ◽  
F. Evangelisti
Keyword(s):  
Atomic Force Microscope ◽  
Material Removal ◽  
Low Cost ◽  
Metal Electrode ◽  
Scanning Probe ◽  
Nanometer Scale ◽  
Quantum Devices ◽  
Positioning Accuracy ◽  
Atomic Force ◽  
Local Oxidation

AbstractScanning probe assisted nanolithography is a very attractive technique in terms of low-cost, patterning resolution and positioning accuracy. Our approach makes use of a commercial atomic force microscope and silicon probes to build simple nanostructures, such as metal electrode pairs, for application in novel quantum devices.Sub-100 nm patterning was successfully performed using three different techniques: direct material removal, scanning probe assisted mask patterning and local oxidation.

scholarly journals Prospects of scanning probe microscopy for nanometer-scale lithography.

1995 ◽  
Vol 8 (4) ◽  
pp. 669-676 ◽  
Author(s):  
LARRY AKIO NAGAHARA ◽  
HIROTAKA OHNO ◽  
HIROSHI TOKUMOTO
Keyword(s):  
Scanning Probe Microscopy ◽  
Scanning Probe ◽  
Nanometer Scale ◽  
Probe Microscopy

scholarly journals Advanced Nanomeasuring Techniques for Surface Characterization

ISRN Optics ◽  
2012 ◽  
Vol 2012 ◽  
pp. 1-23 ◽  
Author(s):  
Salah H. R. Ali
Keyword(s):  
Scanning Probe Microscopy ◽  
Surface Characterization ◽  
Technical Committee ◽  
Scanning Probe ◽  
Nanometer Scale ◽  
Measuring Techniques ◽  
Basic Approaches ◽  
Computing Measuring ◽  
Areal Surface

Advanced precise and accurate nanomeasurement techniques play an important role to improve the function and quality of surface characterization. There are two basic approaches, the hard measuring techniques and the soft computing measuring techniques. The advanced soft measuring techniques include coordinate measuring machines, roundness testing facilities, surface roughness, interferometric methods, confocal optical microscopy, scanning probe microscopy, and computed tomography at the level of nanometer scale. On the other hand, a new technical committee in ISO is established to address characterization issues posed by the areal surface texture and measurement methods. This paper reviews the major advanced soft metrology techniques obtained by optical, tactile, and other means using instruments, classification schemes of them, and their applications in the engineering surfaces. Furthermore, future trends under development in this area are presented and discussed to display proposed solutions for the important issues that need to be addressed scientifically.

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