High-Performance Graphene Devices on SiO2/Si Substrate Modified by Highly Ordered Self-Assembled Monolayers

2011 ◽  
Vol 23 (21) ◽  
pp. 2464-2468 ◽  
Author(s):  
Xiaomu Wang ◽  
Jian-Bin Xu ◽  
Chengliang Wang ◽  
Jun Du ◽  
Weiguang Xie
Keyword(s):  
High Performance ◽  
Self Assembled Monolayers ◽  
Si Substrate ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Graphene Devices

Preparation of HfO2 Thin Film through Self-Assembled Monolayers on Si Substrate

2010 ◽  
Vol 105-106 ◽  
pp. 255-258
Author(s):  
Yu Qin Zheng ◽  
Guo Qiang Tan ◽  
Hong Yan Miao ◽  
Zhong Liang He ◽  
Ao Xia ◽  
...  
Keyword(s):  
Thin Film ◽  
Crystal Structure ◽  
Surface Characteristics ◽  
Self Assembled Monolayers ◽  
Liquid Phase Deposition ◽  
Si Substrate ◽  
Cubic Crystal ◽  
Assembled Monolayers ◽  
Self Assembled ◽  
Sams Surface

HfO2 thin film was successfully prepared on the silicon substrate by the Liquid Phase Deposition (LPD) and functionalized organic self-assembled monolayers (SAMs) method. Measurement of contact angle showed that SAMs surface characteristics changed from hydrophobic to hydrophilic after UV irradiation. Photographs of Metallographic Microscope showed that octadecyl trichlorosilane-self- assembled monolayers (OTS-SAMs) had an active effect on the deposition of HfO2 thin film. XRD, SEM and AFM images indicated that the HfO2 thin film with cubic crystal structure was smooth, uniform and dense. Its grain size was between 40-100 nm and the height of thin film varies between 20 and 100 nm.

BaTiO3 Functional Ceramics Thin Film Prepared by Self-Assembled Monolayers

2010 ◽  
Vol 105-106 ◽  
pp. 266-269
Author(s):  
Guo Qiang Tan ◽  
Cheng Zhang ◽  
Hong Yan Miao ◽  
Hui Jun Ren ◽  
Ao Xia
Keyword(s):  
Thin Film ◽  
Deposition Temperature ◽  
Precursor Solution ◽  
The Self ◽  
Self Assembled Monolayers ◽  
Si Substrate ◽  
Ph Values ◽  
Batio3 Film ◽  
Assembled Monolayers ◽  
Self Assembled

BaTiO3 thin film was prepared by the self-assembled monolayers technique and liquid phase deposition. The effects of pH values and the deposition temperature on the formation of BaTiO3 film were studied. The results showed that the Si substrate was in the precursor solution with 0.025mol/L (AHFT/BN/BA=1:1:3) and pH= 1.5. At 45°C deposited for 8h and annealed at 600°C for 2h, the BaTiO3 film with higher crystalline was prepared on the functionalized Si substrate. XRD and SEM tests showed that the film deposited in the precursor solution with different pH values appeared BaTiO3 characteristic peaks on the surface of every crystal. As pH values increased to 1.5 from 0.5, the strength of the film diffraction peak increased. But the width of the peak became smaller and the crystalline increased. When pH value was 2, due to the self-polymerized deposition of [Ti(OH)6]2-, it was easy to form the larger particles on the substrate. When the deposition temperature was 45°C, the acicular BaTiO3 film formed with the regular order and homogeneous planeness on the substrate. When the deposition temperature was between 55°C and 60°C, the dewatering and polymerizing speed between [Ti(OH)6]2- ions was higher than that between [Ti(OH)6]2- and -OH. The adsorption of the film to the Si substrate was weakened. It was easy for the film to fall off.

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