Block Copolymer Nanostructures: Nanoscopic Morphologies in Block Copolymer Nanorods as Templates for Atomic-Layer Deposition of Semiconductors (Adv. Mater. 27/2009)

2009 ◽  
Vol 21 (27) ◽  
pp. n/a-n/a ◽  
Author(s):  
Yong Wang ◽  
Yong Qin ◽  
Andreas Berger ◽  
Eric Yau ◽  
Changcheng He ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition

Circular Double-Patterning Lithography Using a Block Copolymer Template and Atomic Layer Deposition

2018 ◽  
Vol 5 (16) ◽  
pp. 1800054 ◽  
Author(s):  
Zhixin Wan ◽  
Ha Jin Lee ◽  
Hyun Gu Kim ◽  
Gyeong Cheon Jo ◽  
Woon Ik Park ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Double Patterning

Nanoporous gyroid metal oxides with controlled thickness and composition by atomic layer deposition from block copolymer templates

2016 ◽  
Vol 4 (4) ◽  
pp. 840-849 ◽  
Author(s):  
Wei-Chun Ma ◽  
Wei-Shiang Huang ◽  
Ching-Shun Ku ◽  
Rong-Ming Ho
Keyword(s):  
Mechanical Properties ◽  
Block Copolymer ◽  
Atomic Layer Deposition ◽  
Specific Surface ◽  
Metal Oxides ◽  
Atomic Layer ◽  
High Porosity ◽  
Large Specific Surface Area ◽  
Layer Deposition ◽  
Superior Mechanical Properties

Nanoporous gyroid metal oxides were fabricated with controlled tube thickness and composition by templated atomic layer deposition giving high porosity and large specific surface area as well as superior mechanical properties.

Formation of Titania/Silica Hybrid Nanowires Containing Linear Mesocage Arrays by Evaporation-Induced Block-Copolymer Self-Assembly and Atomic Layer Deposition

2007 ◽  
Vol 119 (36) ◽  
pp. 6953-6956 ◽  
Author(s):  
Xin Chen ◽  
Mato Knez ◽  
Andreas Berger ◽  
Kornelius Nielsch ◽  
Ulrich Gösele ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Atomic Layer Deposition ◽  
Self Assembly ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Silica Hybrid

scholarly journals Synthesis of Double-Shelled Hollow Inorganic Nanospheres through Block Copolymer-Metal Coordination and Atomic Layer Deposition

Polymers ◽  
2019 ◽  
Vol 11 (7) ◽  
pp. 1208 ◽  
Author(s):  
Nina Yan ◽  
Qingbao Guan ◽  
Zhiming Yang ◽  
Min Feng ◽  
Xizhi Jiang ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Block Copolymers ◽  
Atomic Layer Deposition ◽  
Self Assembly ◽  
Lithium Ion ◽  
Polymeric Composite ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Ligand Coordination ◽  
Metal Ligand

Double-shelled hollow (DSH) structures with varied inorganic compositions are confirmed to have improved performances in diverse applications, especially in lithium ion battery. However, it is still of great challenge to obtain these complex nanostructures with traditional hard templates and solution-based route. Here we report an innovative pathway for the preparation of the DSH nanospheres based on block copolymer self-assembly, metal–ligand coordination and atomic layer deposition. Polymeric composite micelles derived from amphiphilic block copolymers and ferric ions were prepared with heating-enabled micellization and metal–ligand coordination. The DSH nanospheres with Fe2O3 stands inner and TiO2 outer the structures can be obtained with atomic layer deposition of a thin layer of TiO2 followed with calcination in air. The coordination was carried out at room temperature and the deposition was performed at the low temperature of 80 °C, thus providing a feasible fabrication strategy for DSH structures without destruction of the templates. The cavity and the outer layer of the structures can also be simply tuned with the utilized block copolymers and the deposition cycles. These DSH inorganic nanospheres are expected to find vital applications in battery, catalysis, sensing and drug delivery, etc.

Atomic layer deposition assisted pattern transfer technology for ultra-thin block copolymer films

2016 ◽  
Vol 613 ◽  
pp. 32-37 ◽  
Author(s):  
Wenhui Chen ◽  
Jun Luo ◽  
Lingkuan Meng ◽  
Junjie Li ◽  
Jinjuan Xiang ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Pattern Transfer ◽  
Copolymer Films ◽  
Layer Deposition

Atomic Layer Deposition Assisted Pattern Multiplication of Block Copolymer Lithography for 5 nm Scale Nanopatterning

2014 ◽  
Vol 24 (27) ◽  
pp. 4343-4348 ◽  
Author(s):  
Hyoung-Seok Moon ◽  
Ju Young Kim ◽  
Hyeong Min Jin ◽  
Woo Jae Lee ◽  
Hyeon Jin Choi ◽  
...  
Keyword(s):  
Block Copolymer ◽  
Atomic Layer Deposition ◽  
Atomic Layer ◽  
Layer Deposition ◽  
Block Copolymer Lithography ◽  
Copolymer Lithography
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