Large-Area Chemical Vapor Deposited MoS2with Transparent Conducting Oxide Contacts toward Fully Transparent 2D Electronics

2017 ◽  
Vol 27 (41) ◽  
pp. 1703119 ◽  
Author(s):  
Zhenyu Dai ◽  
Zhenwei Wang ◽  
Xin He ◽  
Xi-Xiang Zhang ◽  
Husam N. Alshareef
Keyword(s):  
Transparent Conducting Oxide ◽  
Chemical Vapor ◽  
Large Area ◽  
Transparent Conducting ◽  
Chemical Vapor Deposited

CRYSTAL STRUCTURE AND PROPERTIES OF CU-AL-O THIN FILMS

2002 ◽  
Vol 16 (01n02) ◽  
pp. 308-313 ◽  
Author(s):  
YUE WANG ◽  
HAO GONG ◽  
LING LIU
Keyword(s):  
Thin Films ◽  
Transparent Conducting Oxide ◽  
Chemical Vapor ◽  
X Ray Diffraction ◽  
Transparent Conducting ◽  
Potential Applications ◽  
Metal Organic ◽  
Hall Effect Measurements ◽  
Organic Precursors ◽  
P Type

P-type transparent conducting oxide thin films have attracted much attention due to their potential applications in novel transparent p-n junction devices. In this work, the transparent conducting Cu-Al-O thin films were prepared by the plasma enhanced chemical vapor deposition using metal organic precursors of Cu(acac) 2 and Al(acac) 3 (acac=acetylacetonate) while the substrate temperature was varied from 700 to 800°C. The x-ray diffraction and SEM results are analyzed to investigate the structure of the as-deposited and annealed films. The films contain metal copper and small grains of CuAlO 2. After annealing, metal copper turned into CuO . Hall effect measurements reveal that these films are p-type semiconductors and the film conductivity increased with the growth temperature.

Characteristics of Large-Area Plasma Enhanced Chemical Vapor Deposited TEOS Oxide with Various Short-Time Plasma Treatments

2001 ◽  
Vol 685 ◽  
Author(s):  
Ting-Kuo Chang ◽  
Ching-Wei Lin ◽  
Chang-Ho Tseng ◽  
Huang-Chung Cheng ◽  
Yuan-Ching Peng ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Chemical Vapor ◽  
Electrical Strength ◽  
Large Area ◽  
Plasma Treatments ◽  
Chemical Vapor Deposited ◽  
Bias Temperature Stress ◽  
Short Time ◽  
Harmful Effects

AbstractIn this work, high quality silicon dioxide (SiO2) films were prepared by large-area plasmaenhanced chemical vapor deposition (LA-PECVD) using tetraethylorthosilicate(TEOS)-oxygen based chemistry. The effects of various short-time plasma treatments on these as-deposited TEOS oxide were also investigated. Different plasma treatments such as O2, N2O, and NH3 were used in our experiments. Electrical characteristics were exploited to examine the effects of plasma treatments. It was shown that after N2O, and NH3 plasma treatments, the electrical strength of oxide was enhanced. Besides, NH3 plasma treatment exhibited the highest enhancement efficiency. O2- plasma treatment, however, showed some harmful effects on the electrical properties of the TEOS oxide. The reliability tests including charge to breakdown (Qbd) and bias temperature stress (BTS) were also analyzed in these samples. Although better pre-stress characteristics were observed in those samples treated by NH3-plasma, samples with N2O plasma treatment showed superior stress endurance. Consequently, N2O plasma treatment seems to be the best candidate for future TFTs under the consideration of long-term reliability.

scholarly journals Electrical Homogeneity of Large-Area Chemical Vapor Deposited Multilayer Hexagonal Boron Nitride Sheets

2017 ◽  
Vol 9 (46) ◽  
pp. 39895-39900 ◽  
Author(s):  
Fei Hui ◽  
Wenjing Fang ◽  
Wei Sun Leong ◽  
Tewa Kpulun ◽  
Haozhe Wang ◽  
...  
Keyword(s):  
Boron Nitride ◽  
Hexagonal Boron Nitride ◽  
Chemical Vapor ◽  
Large Area ◽  
Chemical Vapor Deposited

scholarly journals Correction: Tunable large-area phase reversion in chemical vapor deposited few-layer MoTe2 films

2019 ◽  
Vol 7 (37) ◽  
pp. 11650-11650
Author(s):  
Xukun Zhu ◽  
Aolin Li ◽  
Di Wu ◽  
Peng Zhu ◽  
Haiyan Xiang ◽  
...  
Keyword(s):  
Chemical Vapor ◽  
Large Area ◽  
Chemical Vapor Deposited

Correction for ‘Tunable large-area phase reversion in chemical vapor deposited few-layer MoTe2 films’ by Xukun Zhu et al., J. Mater. Chem. C, 2019, 7, 10598–10604.

Tunable large-area phase reversion in chemical vapor deposited few-layer MoTe2 films

2019 ◽  
Vol 7 (34) ◽  
pp. 10598-10604 ◽  
Author(s):  
Xukun Zhu ◽  
Aolin Li ◽  
Di Wu ◽  
Peng Zhu ◽  
Haiyan Xiang ◽  
...  
Keyword(s):  
Phase Transition ◽  
Heat Treatment ◽  
Large Scale ◽  
Chemical Vapor ◽  
Large Area ◽  
Reversible Phase Transition ◽  
Chemical Vapor Deposited ◽  
Reversible Phase

A local large-scale reversible phase transition of MoTe2 film was accomplished through the heat treatment.

Rotating Disk Reactor-Low Pressure Metal Organic Chemical Vapor Deposition (Mocvd) of Optical Films

1999 ◽  
Vol 597 ◽  
Author(s):  
John McAleese ◽  
L. Gary Provost ◽  
Gary S. Tompa ◽  
Andrei Colibaba-Evulet ◽  
Nick G. Gulmac ◽  
...  
Keyword(s):  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Transparent Conducting Oxide ◽  
Chemical Vapor ◽  
Rotating Disk ◽  
Organic Chemical ◽  
Transparent Conducting ◽  
Rotating Disk Reactor ◽  
Metal Organic ◽  
Organic Chemical Vapor Deposition

AbstractOver the past 30 years, the need for transparent conducting oxide coatings has been met almost exclusively by tin doped indium-oxide. As the display market advances in complexity, the demand for alternative transparent materials exhibiting high conductivity and stability has become greater. In this paper, we discuss briefly the merits of using doped ZnO as a superior transparent conducting oxide. We report here our results in scaling our ZnO MOCVD reactor technology from 5° to 12° diameter susceptors. Using Rotating Disk Reactor-Low Pressure Metal Organic Chemical Vapor Deposition, we have been able to obtain large area uniformity on multiple (14 cm × 9 cm) glass sheets per deposition run. Promising film characteristics suggest significant application in the field of flat panel displays and other optical systems may be possible.

Optical properties of large-area polycrystalline chemical vapor deposited graphene by spectroscopic ellipsometry

2010 ◽  
Vol 97 (25) ◽  
pp. 253110 ◽  
Author(s):  
F. J. Nelson ◽  
V. K. Kamineni ◽  
T. Zhang ◽  
E. S. Comfort ◽  
J. U. Lee ◽  
...  
Keyword(s):  
Optical Properties ◽  
Spectroscopic Ellipsometry ◽  
Chemical Vapor ◽  
Large Area ◽  
Chemical Vapor Deposited
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