Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)
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110

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Key trends in the semiconductor industry

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) ◽

10.1109/issm.2000.993711 ◽

2005 ◽

Author(s):

J. Dickson

Keyword(s):

Semiconductor Industry

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Process optimization and interface cotrol in chemical vapor deposition of high dielectric constant thin films

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) ◽

10.1109/issm.2000.993712 ◽

2005 ◽

Author(s):

Y. Gao ◽

C.L. Perkins ◽

M.A. Henderson ◽

J.W. Rogers

Keyword(s):

Thin Films ◽

Dielectric Constant ◽

Chemical Vapor Deposition ◽

Process Optimization ◽

Vapor Deposition ◽

High Dielectric Constant ◽

Chemical Vapor ◽

High Dielectric

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AMd's Fab 30 Dresden, Germany

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) ◽

10.1109/issm.2000.993713 ◽

2005 ◽

Author(s):

J. Doran

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Yield analysis and improvement by reducing manufacturing fluctuation noise

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) ◽

10.1109/issm.2000.993660 ◽

2002 ◽

Cited By ~ 7

Author(s):

H. Tsuda ◽

H. Shirai ◽

O. Takagi ◽

R. Take

Keyword(s):

Yield Analysis ◽

Fluctuation Noise

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Petri net simulation of manufacturing systems considering multiple machines, operators, and maintenance for a product-mix

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) ◽

10.1109/issm.2000.993682 ◽

2002 ◽

Author(s):

S. Arima ◽

K. Saito

Keyword(s):

Petri Net ◽

Manufacturing Systems ◽

Product Mix ◽

Multiple Machines

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The short-loop process tuning & yield evaluation by using the addressable failure site test structures (AFS-TS)

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) ◽

10.1109/issm.2000.993647 ◽

2002 ◽

Cited By ~ 3

Author(s):

K. Yih-Yuh Doong ◽

Sunnys Hsieh ◽

Sheng-Che Lin ◽

Binson Shen ◽

C.C.-H. Hsu

Keyword(s):

Short Loop ◽

Site Test ◽

Failure Site

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Yield model with redundancy based on critical area calculations

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) ◽

10.1109/issm.2000.993645 ◽

2002 ◽

Cited By ~ 2

Author(s):

K. Mitsutake ◽

Y. Ushiku

Keyword(s):

Critical Area ◽

Yield Model

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Intelligent yield prediction models for high-speed microprocessors

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) ◽

10.1109/issm.2000.993644 ◽

2002 ◽

Author(s):

Tae Seon Kim ◽

Se Hwan Ahn ◽

Young Gyun Jang ◽

Jeong In Lee ◽

Kil Jae Lee ◽

...

Keyword(s):

High Speed ◽

Prediction Models ◽

Yield Prediction

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An approach to determine appropriate fab development plans by taking space constraints and cost-effectiveness into consideration

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) ◽

10.1109/issm.2000.993652 ◽

2002 ◽

Cited By ~ 3

Author(s):

Jui-ling Yang

Keyword(s):

Cost Effectiveness ◽

Development Plans

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High controllability and low cost APM process by one-bath type wet-bench for multi gate oxide pre-cleaning

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) ◽

10.1109/issm.2000.993678 ◽

2002 ◽

Cited By ~ 2

Author(s):

T. Suzuki ◽

H. Kunishima ◽

T. Wake ◽

S. Chikaki

Keyword(s):

Low Cost ◽

Gate Oxide

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Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)Latest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Ultra Clean Soc

Key trends in the semiconductor industry

Process optimization and interface cotrol in chemical vapor deposition of high dielectric constant thin films

AMd's Fab 30 Dresden, Germany

Yield analysis and improvement by reducing manufacturing fluctuation noise

Petri net simulation of manufacturing systems considering multiple machines, operators, and maintenance for a product-mix

The short-loop process tuning & yield evaluation by using the addressable failure site test structures (AFS-TS)

Yield model with redundancy based on critical area calculations

Intelligent yield prediction models for high-speed microprocessors

An approach to determine appropriate fab development plans by taking space constraints and cost-effectiveness into consideration

High controllability and low cost APM process by one-bath type wet-bench for multi gate oxide pre-cleaning

Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)
Latest Publications