Polymers for High Technology - ACS Symposium Series
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0841214069, 0841211892
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Soluble Polysilanes in Photolithography

1987 ◽  
pp. 170-187 ◽  
Author(s):  
R. D. Miller ◽  
D. Hofer ◽  
J. Rabolt ◽  
R. Sooriyakumaran ◽  
C. G. Willson ◽  
...  

Stress Analysis of the Silicon Chip-Plastic Encapsulant Interface

1987 ◽  
pp. 537-546 ◽  
Author(s):  
S. Oizumi ◽  
N. Imamura ◽  
H. Tabata ◽  
H. Suzuki
Keyword(s):  
Stress Analysis

Evaluation of Water-Soluble Diazonium Salts as Contrast-Enhancement Materials Using a g-Line Stepper

1987 ◽  
pp. 188-199 ◽  
Author(s):  
S.-I. Uchino ◽  
T. Ueno ◽  
T. Iwayanagi ◽  
H. Morishita ◽  
S. Nonogaki ◽  
...  
Keyword(s):  
Contrast Enhancement ◽  
Water Soluble ◽  
Diazonium Salts

Patterning of Fine Via Holes in Polyimide by an Oxygen Reactive Ion Etching Method

1987 ◽  
pp. 547-556
Author(s):  
Hiroshi Suzuki ◽  
Hiroyoshi Sekine ◽  
Shigeru Koibuchi ◽  
Hidetaka Sato ◽  
Daisuke Makino
Keyword(s):  
Reactive Ion Etching ◽  
Ion Etching ◽  
Etching Method ◽  
Via Holes

Oxygen Ion Etching Resistance of Organosilicon Polymers

1987 ◽  
pp. 358-368 ◽  
Author(s):  
H. Gokan ◽  
Y. Saotome ◽  
K. Saigo ◽  
F. Watanabe ◽  
Y. Ohnishi
Keyword(s):  
Ion Etching ◽  
Oxygen Ion ◽  
Organosilicon Polymers
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