2007 International Symposium on Semiconductor Manufacturing
Latest Publications

TOTAL DOCUMENTS

120

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H-INDEX

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Published By IEEE

9781424411412

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300mm prime gaps that need to be addressed to boost productivity

2007 International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2007.4446821 ◽

2007 ◽

Cited By ~ 2

Author(s):

Les Marshall ◽

Kristin Rust ◽

Kilian Schmidt

Keyword(s):

Prime Gaps

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Development of a high efficiency PFC abatement system utilizing plasma and Ca(OH)2/CaO under a decompression atmosphere

2007 International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2007.4446796 ◽

2007 ◽

Author(s):

K. Suzuki ◽

Y. Ishihara ◽

K. Sakoda ◽

Y. Shirai ◽

M. Hirayama ◽

...

Keyword(s):

High Efficiency

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Yield prediction techniques based on DFM rules and criticality for 65nm technology and beyond

2007 International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2007.4446785 ◽

2007 ◽

Author(s):

Tsutomu Kojima ◽

S. Kyou ◽

H. Murakami ◽

K. Honda ◽

T. Nakayama ◽

...

Keyword(s):

Yield Prediction ◽

Prediction Techniques

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Using electrostatic repulsion to prevent adhesion of infinitesimal particles

2007 International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2007.4446896 ◽

2007 ◽

Author(s):

Junji Oikawa ◽

Terumi Yamashita ◽

Hidefumi Matsui ◽

Akitake Tamura ◽

Teruyuki Hayashi

Keyword(s):

Electrostatic Repulsion

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Yield characterization of high-current ion implantation particles on 65 nm CMOS transistors

2007 International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2007.4446889 ◽

2007 ◽

Author(s):

Brian Whitson ◽

Aaron Vanderpool

Keyword(s):

Ion Implantation ◽

High Current ◽

Cmos Transistors

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Cross area lot arrangement — shortest inter cycle time

2007 International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2007.4446805 ◽

2007 ◽

Cited By ~ 1

Author(s):

Yih-Yi Lee ◽

Chun-Chiej Hsiao

Keyword(s):

Cycle Time

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Ambient gas control in slot-to-slot space inside FOUP to suppress Cu-loss after dual damascene patterning

2007 International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2007.4446864 ◽

2007 ◽

Author(s):

Takao Kamoshima ◽

Yasuhisa Fujii ◽

Toshimitsu Noguchi ◽

Tomonori Saeki ◽

Yoshifumi Takata ◽

...

Keyword(s):

Dual Damascene ◽

Ambient Gas ◽

Gas Control

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Implementation of double patterning lithography process using limited illumination systems

2007 International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2007.4446858 ◽

2007 ◽

Author(s):

CI Choi ◽

Miller Qiu ◽

Winter Li ◽

Hans Sui ◽

Fumitake Mieno

Keyword(s):

Lithography Process ◽

Double Patterning

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Start up optimization for point of use filter in lithography process

2007 International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2007.4446873 ◽

2007 ◽

Author(s):

Toru Umeda ◽

Shuichi Tsuzuki ◽

Toru Numaguchi ◽

Norio Sato ◽

Chikara Yamamoto ◽

...

Keyword(s):

Lithography Process ◽

Point Of Use ◽

Start Up

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Forward echelon-based inventory monitoring in semiconductor supply chain

2007 International Symposium on Semiconductor Manufacturing ◽

10.1109/issm.2007.4446882 ◽

2007 ◽

Cited By ~ 1

Author(s):

Ruey-Shan Guo ◽

David Chiang ◽

Hong-Wen Lin ◽

Mei-Shang Guo

Keyword(s):

Supply Chain

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2007 International Symposium on Semiconductor ManufacturingLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By IEEE

300mm prime gaps that need to be addressed to boost productivity

Development of a high efficiency PFC abatement system utilizing plasma and Ca(OH)2/CaO under a decompression atmosphere

Yield prediction techniques based on DFM rules and criticality for 65nm technology and beyond

Using electrostatic repulsion to prevent adhesion of infinitesimal particles

Yield characterization of high-current ion implantation particles on 65 nm CMOS transistors

Cross area lot arrangement — shortest inter cycle time

Ambient gas control in slot-to-slot space inside FOUP to suppress Cu-loss after dual damascene patterning

Implementation of double patterning lithography process using limited illumination systems

Start up optimization for point of use filter in lithography process

Forward echelon-based inventory monitoring in semiconductor supply chain

2007 International Symposium on Semiconductor Manufacturing
Latest Publications