Dry Etching for Microelectronics - Materials Processing: Theory and Practices
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Published By Elsevier

9780444869050

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Plasma-Assisted Etching of Aluminum and Aluminum Alloys

Dry Etching for Microelectronics - Materials Processing: Theory and Practices ◽

10.1016/b978-0-444-86905-0.50007-6 ◽

1984 ◽

pp. 1-38 ◽

Cited By ~ 1

Author(s):

DENNIS W. HESS ◽

RICHARD H. BRUCE

Keyword(s):

Aluminum Alloys

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Advisory Board

Dry Etching for Microelectronics - Materials Processing: Theory and Practices ◽

10.1016/b978-0-444-86905-0.50006-4 ◽

1984 ◽

pp. x

Keyword(s):

Advisory Board

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Subject Index

Dry Etching for Microelectronics - Materials Processing: Theory and Practices ◽

10.1016/b978-0-444-86905-0.50012-x ◽

1984 ◽

pp. 295-299

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Reactive Ion Beam Etching

Dry Etching for Microelectronics - Materials Processing: Theory and Practices ◽

10.1016/b978-0-444-86905-0.50010-6 ◽

1984 ◽

pp. 113-214 ◽

Cited By ~ 6

Author(s):

R.A. POWELL ◽

D.F. DOWNEY

Keyword(s):

Ion Beam ◽

Ion Beam Etching ◽

Reactive Ion Beam Etching

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Introduction to the Series

Dry Etching for Microelectronics - Materials Processing: Theory and Practices ◽

10.1016/b978-0-444-86905-0.50003-9 ◽

1984 ◽

pp. v

Author(s):

Franklin F.Y. WANG

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Preface to Volume 4

Dry Etching for Microelectronics - Materials Processing: Theory and Practices ◽

10.1016/b978-0-444-86905-0.50005-2 ◽

1984 ◽

pp. vii-ix

Author(s):

Ronald A. POWELL

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Plasma Etching of Refractory Gates of Metals, Silicides and Nitrides

Dry Etching for Microelectronics - Materials Processing: Theory and Practices ◽

10.1016/b978-0-444-86905-0.50008-8 ◽

1984 ◽

pp. 39-77 ◽

Cited By ~ 3

Author(s):

T. PAUL CHOW ◽

A.N. SAXENA ◽

L.M. EPHRATH ◽

R.S. BENNETT

Keyword(s):

Plasma Etching

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Previous Volumes in the Series

Dry Etching for Microelectronics - Materials Processing: Theory and Practices ◽

10.1016/b978-0-444-86905-0.50004-0 ◽

1984 ◽

pp. vi

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Front Matter

Dry Etching for Microelectronics - Materials Processing: Theory and Practices ◽

10.1016/b978-0-444-86905-0.50001-5 ◽

1984 ◽

pp. iii

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Dry Etching for Microelectronics-A Bibliography

Dry Etching for Microelectronics - Materials Processing: Theory and Practices ◽

10.1016/b978-0-444-86905-0.50011-8 ◽

1984 ◽

pp. 215-294 ◽

Cited By ~ 1

Author(s):

L.C. MOLIERI

Keyword(s):

Dry Etching

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Dry Etching for Microelectronics - Materials Processing: Theory and PracticesLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Elsevier

Plasma-Assisted Etching of Aluminum and Aluminum Alloys

Advisory Board

Subject Index

Reactive Ion Beam Etching

Introduction to the Series

Preface to Volume 4

Plasma Etching of Refractory Gates of Metals, Silicides and Nitrides

Previous Volumes in the Series

Front Matter

Dry Etching for Microelectronics-A Bibliography

Dry Etching for Microelectronics - Materials Processing: Theory and Practices
Latest Publications