Advances In Atomic, Molecular, and Optical Physics - Fundamentals of Plasma Chemistry
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9780120038435

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Contents of Volumes in This Serial

Advances In Atomic, Molecular, and Optical Physics - Fundamentals of Plasma Chemistry ◽

10.1016/s1049-250x(00)65005-x ◽

2000 ◽

pp. 415-424

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Fundamental Processes of Plasma–Surface Interactions

Advances In Atomic, Molecular, and Optical Physics - Fundamentals of Plasma Chemistry ◽

10.1016/s1049-250x(08)60129-9 ◽

2000 ◽

pp. 341-371

Author(s):

Rainer Hippler

Keyword(s):

Surface Interactions ◽

Plasma Surface ◽

Plasma Surface Interactions

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Kinetic Energy Dependence of Ion–Molecule Reactions Related to Plasma Chemistry

Advances In Atomic, Molecular, and Optical Physics - Fundamentals of Plasma Chemistry ◽

10.1016/s1049-250x(08)60125-1 ◽

2000 ◽

pp. 187-229 ◽

Cited By ~ 7

Author(s):

P.B. Armentrout

Keyword(s):

Kinetic Energy ◽

Energy Dependence ◽

Plasma Chemistry ◽

Ion Molecule Reactions

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Physicochemical Aspects of Atomic and Molecular Processes in Reactive Plasmas

Advances In Atomic, Molecular, and Optical Physics - Fundamentals of Plasma Chemistry ◽

10.1016/s1049-250x(08)60126-3 ◽

2000 ◽

pp. 231-241 ◽

Cited By ~ 15

Author(s):

Yoshihiko Hatano

Keyword(s):

Molecular Processes ◽

Atomic And Molecular Processes

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Editors

Advances In Atomic, Molecular, and Optical Physics - Fundamentals of Plasma Chemistry ◽

10.1016/s1049-250x(08)60116-0 ◽

2000 ◽

pp. ii

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Uses of High-Sensitivity White-Light Absorption Spectroscopy in Chemical Vapor Deposition and Plasma Processing

Advances In Atomic, Molecular, and Optical Physics - Fundamentals of Plasma Chemistry ◽

10.1016/s1049-250x(08)60128-7 ◽

2000 ◽

pp. 295-339 ◽

Cited By ~ 11

Author(s):

L.W Anderson ◽

A.N. Goyette ◽

J.E. Lawler

Keyword(s):

Chemical Vapor Deposition ◽

Absorption Spectroscopy ◽

White Light ◽

Vapor Deposition ◽

Light Absorption ◽

Plasma Processing ◽

Chemical Vapor ◽

High Sensitivity

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Contributors

Advances In Atomic, Molecular, and Optical Physics - Fundamentals of Plasma Chemistry ◽

10.1016/s1049-250x(08)60119-6 ◽

2000 ◽

pp. ix-x

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Series Page

Advances In Atomic, Molecular, and Optical Physics - Fundamentals of Plasma Chemistry ◽

10.1016/s1049-250x(08)60117-2 ◽

2000 ◽

pp. iii

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Electron Collision Data for Plasma Chemistry Modeling

Advances In Atomic, Molecular, and Optical Physics - Fundamentals of Plasma Chemistry ◽

10.1016/s1049-250x(08)60122-6 ◽

2000 ◽

pp. 79-110 ◽

Cited By ~ 64

Author(s):

W.L. Morgan

Keyword(s):

Plasma Chemistry ◽

Electron Collision ◽

Chemistry Modeling

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Opportunities and Challenges for Atomic, Molecular, and Optical Physics in Plasma Chemistry

Advances In Atomic, Molecular, and Optical Physics - Fundamentals of Plasma Chemistry ◽

10.1016/s1049-250x(08)60131-7 ◽

2000 ◽

pp. 399-406 ◽

Cited By ~ 6

Author(s):

Kurt Becker ◽

Hans Deutsch ◽

Mitio Inokuti

Keyword(s):

Plasma Chemistry

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Advances In Atomic, Molecular, and Optical Physics - Fundamentals of Plasma ChemistryLatest Publications

TOTAL DOCUMENTS

H-INDEX

Published By Elsevier

Contents of Volumes in This Serial

Fundamental Processes of Plasma–Surface Interactions

Kinetic Energy Dependence of Ion–Molecule Reactions Related to Plasma Chemistry

Physicochemical Aspects of Atomic and Molecular Processes in Reactive Plasmas

Editors

Uses of High-Sensitivity White-Light Absorption Spectroscopy in Chemical Vapor Deposition and Plasma Processing

Contributors

Series Page

Electron Collision Data for Plasma Chemistry Modeling

Opportunities and Challenges for Atomic, Molecular, and Optical Physics in Plasma Chemistry

Advances In Atomic, Molecular, and Optical Physics - Fundamentals of Plasma Chemistry
Latest Publications