Defects in High-k Gate Dielectric Stacks - NATO Science Series II: Mathematics, Physics and Chemistry
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IMPACT OF HIGH-κ PROPERTIES ON MOSFET ELECTRICAL CHARACTERISTICS

2006 ◽  
pp. 97-108 ◽  
Author(s):  
LUIGI PANTISANO ◽  
L-Å. RAGNARSSON ◽  
M. HOUSSA ◽  
R. DEGRAEVE ◽  
G. GROESENEKEN ◽  
...  
Keyword(s):  
Electrical Characteristics

FIXED OXIDE CHARGE IN Ru-BASED CHEMICAL VAPOUR DEPOSITED HIGH-κ GATE STACKS

2006 ◽  
pp. 277-286
Author(s):  
KAROL FROHLICH ◽  
ROMAN LUPTÁK1 ◽  
MILAN ŤAPAJNA ◽  
KRISTÍNA HUŠEKOVÁ ◽  
U. WEBER ◽  
...  
Keyword(s):  
Chemical Vapour ◽  
Gate Stacks ◽  
Oxide Charge

DEFECT-RELATED ISSUES IN HIGH-K DIELECTRICS

2006 ◽  
pp. 189-202
Author(s):  
SOKRATES T. PANTELIDES ◽  
M.H. EVANS ◽  
D.M. FLEETWOOD ◽  
E. P. GUSEV ◽  
J. D. JOANNOPOULOS ◽  
...  
Keyword(s):  
High K

ELECTRONIC STRUCTURE OF ZRO2 AND HFO2

2006 ◽  
pp. 423-434 ◽  
Author(s):  
T.V. PEREVALOV ◽  
A.V. SHAPOSHNIKOV ◽  
K.A. NASYROV ◽  
D.V. GRITSENKO ◽  
V.A. GRITSENKO ◽  
...  
Keyword(s):  
Electronic Structure

CHARACTERIZATION AND MODELING OF DEFECTS IN HIGH-K MEASUREMENTS LAYERS THROUGH FAST ELECTRICAL TRANSIENT

2006 ◽  
pp. 73-84 ◽  
Author(s):  
JEROME MITARD ◽  
CHARLES LEROUX ◽  
GILLES REIMBOLD ◽  
XAVIER GARROS ◽  
FRANÇOIS MARTIN ◽  
...  
Keyword(s):  
High K
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